KAF 50100 D

KAF-50100
8176 (H) x 6132 (V) Full
Frame CCD Image Sensor
Description
The KAF−50100 Image Sensor is a high performance,
50-megapixel CCD. Based on the TRUESENSE 6.0 micron Full
Frame CCD Platform, the sensor features ultra-high resolution, broad
dynamic range, and a four-output architecture. A lateral overflow
drain suppresses image blooming, while an integrated Pulse Flush
Gate clears residual charge on the sensor with a single electrical pulse.
A Fast Dump Gate can be used to selectively remove a line of charge
to facilitate partial image readout. The sensor also utilizes the
TRUESENSE Transparent Gate Electrode to improve sensitivity
compared to the use of a standard front side illuminated polysilicon
electrode.
The sensor shares a common pin-out and electrical configuration
with the KAF−40000 Image Sensor, allowing a single camera design
to support both members of this sensor family.
www.onsemi.com
Table 1. GENERAL SPECIFICATIONS
Parameter
Figure 1. KAF−50100 Full Frame CCD
Image Sensor
Typical Value
Architecture
Full Frame CCD (Square Pixels)
Total Number of Pixels
8304 (H) × 6220 (V) = 51.6 Mp
Number of Effective Pixels
8208 (H) × 6164 (V) = 50.5 Mp
Features
Number of Active Pixels
8176 (H) × 6132 (V) = 50.1 Mp
• TRUESENSE Transparent Gate Electrode
Pixel Size
6.0 mm (H) × 6.0 mm (V)
Active Image Size
49.1 mm (H) × 36.8 mm (V)
61.3 mm (Diagonal),
645 1.1x Optical Format
Aspect Ratio
4:3
Horizontal Outputs
4
Saturation Signal
40.3 ke−
Output Sensitivity
31 mV/e−
Quantum Efficiency
KAF−50100−CAA
KAF−50100−AAA
KAF−50100−ABA (with Lens)
22%, 22%, 16% (Peak R, G, B)
25%
62%
Read Noise (f = 18 MHz)
12.5 e−
Dark Signal (T = 60°C)
42 pA/cm2
Dark Current Doubling Temperature
5.7°C
Dynamic Range (f = 18 MHz)
70.2 dB
Estimated Linear Dynamic Range
(f = 18 MHz)
69.3 dB
Charge Transfer Efficiency
Horizontal
Vertical
•
•
•
•
for High Sensitivity
Ultra-High Resolution
Board Dynamic Range
Low Noise Architecture
Large Active Imaging Area
Applications
•
•
•
•
Digitization
Mapping/Aerial
Photography
Scientific
ORDERING INFORMATION
See detailed ordering and shipping information on page 2 of
this data sheet.
0.999995
0.999999
Blooming Protection
(4 ms Exposure Time)
800X Saturation Exposure
Maximum Date Rate
18 MHz
Package
Ceramic PGA
Cover Glass
MAR Coated, 2 Sides or
Clear Glass
NOTE: All Parameters are specified at T = 40°C unless otherwise noted.
© Semiconductor Components Industries, LLC, 2015
December, 2015 − Rev. 4
1
Publication Order Number:
KAF−50100/D
KAF−50100
ORDERING INFORMATION
Table 2. ORDERING INFORMATION
Part Number
Description
KAF−50100−ABA−JP−BA
Monochrome, Microlens, Enhanced, ESD, Ceramic PGA,
Taped-Clear Cover Glass, Standard Grade
KAF−50100−ABA−JP−AE
Monochrome, Microlens, Enhanced, ESD, Ceramic PGA,
Taped-Clear Cover Glass, Engineering Grade
KAF−50100−ABA−JR−BA (1)
Monochrome, Microlens, Enhanced, ESD, Ceramic PGA,
Taped-Clear Cover Glass with AR Coating (Both Sides), Standard Grade
KAF−50100−ABA−JR−AE (1)
Monochrome, Microlens, Enhanced, ESD, Ceramic PGA,
Taped-Clear Cover Glass with AR Coating (Both Sides), Engineering Grade
KAF−50100−CAA−JD−AA
Color (Bayer RGB), No Microlens, Enhanced, ESD, Ceramic PGA,
Clear Cover Glass with AR Coating (Both Sides), Standard Grade
KAF−50100−CAA−JD−AE
Color (Bayer RGB), No Microlens, Enhanced, ESD, Ceramic PGA,
Clear Cover Glass with AR Coating (Both Sides), Engineering Grade
KAF−50100−AAA−JD−BA
Monochrome, No Microlens, Enhanced, ESD, Ceramic PGA,
Clear Cover Glass with AR Coating (Both Sides), Standard Grade
KAF−50100−AAA−JD−AE
Monochrome, No Microlens, Enhanced, ESD, Ceramic PGA,
Clear Cover Glass with AR Coating (Both Sides), Engineering Grade
Marking Code
KAF−50100−ABA
Serial Number
KAF−50100−ABA
Serial Number
KAF−50100−CAA
Serial Number
KAF−50100−AAA
Serial Number
1. Not recommended for new designs.
See the ON Semiconductor Device Nomenclature document (TND310/D) for a full description of the naming convention
used for image sensors. For reference documentation, including information on evaluation kits, please visit our web site at
www.onsemi.com.
www.onsemi.com
2
KAF−50100
DEVICE DESCRIPTION
Architecture
1 Test Row
26
16
V1
V1
4
KAF−50100
8176 (H) × 6132 (V)
6.0 × 6.0 mm Pixels
4 28 16
H1LR
OG R
4 Blue + 12 Buffer Pixels
29 Dark Pixels
RD L
VOUT LB
VDD LB
PFG
FDG
LOD
4
(Last VCCD Phase = V2)
H1L L
OGL
RG L
VDD LA
VOUT LA
VSS L
VSUB
16 28 4
1 Test Column
PFG
FDG
LOD
1 Test Column
V2
V2
1 10 4 1 4
28 16
4088
RD R
RG R
VDD RA
4088
VOUT RA
16 28 4 1 4 10 1
VSS R
VSUB
1 10 4 1 4
28 16
4088
VOUT RB
16 28 4 1 4 10 1
4088
VDD RB
H1B L
H2 L
H1A L
H1A R
H2R
H1B R
XG
4152 Pixels/Line/Output
NOTE: Showing the filter pattern of the color version.
Figure 2. Block Diagram
Dark Reference Pixels
Surrounding the periphery of the device is a border of light
shielded pixels creating a dark region. Within this dark
region are light shielded pixels that include 28 leading dark
pixels on every line. There are also 29 full dark lines at the
start and 26 full dark lines at the end of every frame. Under
normal circumstances, these pixels do not respond to light
and may be used as a dark reference.
The filter description is for the color version only. No filter
pattern is provided for the monochrome version.
Dummy Pixels
Within each horizontal shift register there are 20 leading
pixels. These are designated as dummy pixels and should not
be used to determine a dark reference level.
Image Acquisition
CTE Monitor Pixels
Two CTE test columns, at the leading end of each output,
and one CTE test row are included for manufacturing test
purposes. The filter description is for the color version only.
No filter pattern is provided for the monochrome version.
An electronic representation of an image is formed when
incident photons falling on the sensor plane create
electron-hole pairs (charge) within the device. These
photon-induced electrons are collected locally by the
formation of potential wells at each pixel site. The number
of electrons collected is linearly dependent on light level and
exposure time and non-linearly dependent on wavelength.
When the pixel’s capacity is reached, excess electrons are
discharged into the lateral overflow drain (LOD) to prevent
crosstalk or ‘blooming’. During the integration period,
the V1 and V2 register clocks are held at a constant (low)
level.
Active Buffer Pixels
Forming the outer boundary of the effective active pixel
region, there are 16 unshielded active buffer pixels between
the photoactive area and the dark reference. These pixels are
light sensitive but they are not tested for defects and
non-uniformities. For the leading 16 active column pixels,
the first 4 pixels are covered with blue pigment while the
remaining are arranged in a Bayer pattern (R, GR, GB, B).
www.onsemi.com
3
KAF−50100
Charge Transport
separate FDG pin. Draining is accomplished by first
clocking V2 high while V1 is held low. This forces all charge
into the V2 phase of the pixel. While V2 is high, PFG
(or FDG) may be clocked high to begin draining the signal
from the pixel to the LOD. Charge transfer out of the pixel
is fully completed only after V2 has been clocked low plus
some characteristic time.
The integrated charge from each pixel in the Vertical CCD
(VCCD) is transported to the output using a two-step
process. Each remaining line (row) of charge is first
transported from the VCCD to a dual parallel split horizontal
register (HCCD) using the V1 and V2 register clocks.
The transfer to the HCCD occurs on the falling edge of V2
while H1A is held high. This line of charge may be readout
immediately (dual split) or may be passed through a transfer
gate (XG) into a second (B) HCCD register while the next
line loads into the first (A) HCCD register (dual parallel
split). Readout of each line in the HCCD is always split at the
middle and, thus, either two or four outputs are used. Left
(or right) outputs carry image content from pixels in the left
(or right) columns of the VCCD. A separate connection to
the last H1 phase (H1L) is provided to improve the transfer
speed of charge to the output amplifier. On each falling edge
of H1L, a new charge packet is sensed by the output
amplifier. Left and right HCCDs are electrically isolated
from each other except for the common transfer gate (XG).
Horizontal Register
Output Structure
The output consists of a floating diffusion connected to
a three-stage source follower. Charge presented to the
floating diffusion (FD) is converted into a voltage and is
current amplified in order to drive off-chip loads.
The resulting voltage change seen at the output is linearly
related to the amount of charge placed on the FD. Once the
signal has been sampled by the system electronics, the reset
gate (RG) is clocked to remove the signal and FD is reset to
the potential applied by reset drain (RD). Increased signal at
the floating diffusion reduces the voltage seen at the output
pin. To activate the output structure, an off-chip current
source must be added to the VOUT pin of the device. See
Figure 4.
Pulsed Flush Gate/Fast Dump Gate
The Pulsed Flush Gate (PFG) feature is used to drain the
charge of all pixels prior to exposure. The exception is pixels
in the Fast Dump Gate (FDG) row that are drained using the
H2
H1
H2
HCCD
Charge
Transfer
HIL
VDD
OG
RG
RD
Floating
Diffusion
VOUT
VSUB
VSS
Source
Follower
#1
Source
Follower
#2
Source
Follower
#3
Figure 3. Output Architecture (Each Output)
www.onsemi.com
4
KAF−50100
Output Load
VDD = +15 V
IOUT = |5 mA|
0.1 mF
VOUT
2N3904 or
Equivalent
Buffered
Video
Output
140 W
1 kW
NOTE: Component values may be revised based on operating conditions and other design considerations.
Figure 4. Recommended Output Structure Load Diagram
www.onsemi.com
5
KAF−50100
Physical Description
Pin Description and Device Orientation
DIRECTION OF TRANSFER
DIRECTION OF TRANSFER
To VOUTLA
To VOUTRA
To VOUTLB
To VOUTRB
PIN 1
Figure 5. Image Transfer Diagram
VSUB
FDG
V1
V2
LOD
1
2
3
4
5
LOD
PFG
V1
V2
LOD
V2
V1
FDG VSUB
14
15
16
17
18
PFG
V2
V1
PFG
LOD
D
D
13
6
C
C
PFG VSUB
VSUB
Top View
VOUTLA VOUTLB OGL RGL H1LL H1BL
XG
VSUB
VSUB
NC
H1BR H1LR RGR
OGR VOUTRB VOUTRA
B
B
1
2
3
4
5
6
7
11 12
8
13
14
15
16
17
18
A
A
VSUB VDDLA VSSL RDL VDDLB
H1AL H2L
H2R H1AR VDDRB RDR VSSR VDDRA VSUB
Notes:
1. Pins with the same name are nominally tied together on the circuit board and have the same operating conditions. In addition, pins labeled
with left (‘L’) and (‘R’) designations may also be tied together except for VOUT pins.
2. To achieve optimal output signal matching, electrical layout of the PCB should be made as symmetrical as possible relative to the left and
right sides of the sensor.
Figure 6. Pinout Diagram
www.onsemi.com
6
KAF−50100
Table 3. PIN DESCRIPTION
Pin
Name
Substrate
C1
LOD
Lateral Overflow Drain
Output Amplifier Supply, Left A
C2
PFG
Pulse Flush Gate
Output Amplifier Return, Left
C3
V1
Vertical Phase 1
Reset Drain, Left
C4
V2
Vertical Phase 2
Output Amplifier Supply, Left B
C5
PFG
Pulse Flush Gate
Horizontal Phase 1, A Left
C6
VSUB
Substrate
Horizontal Phase 2, Left
C13
VSUB
Substrate
Horizontal Phase 2, Right
C14
PFG
Pulse Flush Gate
Horizontal Phase 1, A Right
C15
V2
Vertical Phase 2
Output Amplifier Supply, Right B
C16
V1
Vertical Phase 1
Reset Drain, Right
C17
PFG
Pulse Flush Gate
Output Amplifier Return, Right
C18
LOD
Lateral Overflow Drain
D1
VSUB
D2
FDG
Fast Dump Gate
V1
Vertical Phase 1
Vertical Phase 2
Pin
Name
Description
A1
VSUB
A2
VDDLA
A3
VSSL
A4
RDL
A5
VDDLB
A6
H1AL
A7
H2L
A12
H2R
A13
H1AR
A14
VDDRB
A12
RDR
A16
VSSR
A17
VDDRA
Output Amplified Supply, Right A
A18
VSUB
Substrate
Description
Substrate
B1
VOUTLA
Video Output, Left A
D3
B2
VOUTLB
Video Output, Left B
D4
V2
B3
OGL
Output Gate, Left
D5
LOD
Lateral Overflow Drain
B4
RGL
Reset Gate, Left
D14
LOD
Lateral Overflow Drain
B5
H1LL
Horizontal Phase 1, Last Gate, Left
D15
V2
Vertical Phase 2
B6
H1BL
Horizontal Phase 1, B Left
D16
V1
Vertical Phase 1
Fast Dump Gate
B7
XG
Horizontal Transfer Gate
D17
FDG
B8
VSUB
Substrate
D18
VSUB
Substrate
Substrate
NOTE: The leads are on a 0.100″ spacing.
B11
VSUB
B12
NC
B13
H1BR
Horizontal Phase 1, B Right
B14
H1LR
Horizontal Phase 1, Last Gate, Right
B15
RGR
Reset Gate, Right
B16
OGR
Output Gate, Right
B17
VOUTRB
Video Output, Right B
B18
VOUTRA
Video Output, Right A
No Connection
www.onsemi.com
7
KAF−50100
IMAGING PERFORMANCE
Table 4. TYPICAL OPERATIONAL CONDITIONS
Description
Test Condition − Unless Otherwise Noted
Units
1,001
1,754
ms
Frame Time (tREADOUT + tINT)
Integration Time (tINT)
Notes
Dual Parallel Split
Dual Split
Variable
Horizontal Clock Frequency
18
MHz
Temperature
25
°C
Operation
Room Temperature
Nominal Operating Levels
Table 5. SPECIFICATIONS
Symbol
Min.
Nom.
Max.
Units
Notes
Verification
Plan15
Saturation Signal
NSAT
Ne−SAT
Q/V
1,075
−
−
1,250
40.3
31
−
−
−
mV
ke−
mV/e−
1
Die
Quantum Efficiency (Color)
Red
Green
Blue
QEMAX
−
−
−
22
22
16
−
−
−
Quantum Efficiency (Monochrome)
@ 450 nm
QEMAX
−
25
−
Photoresponse Non-Linearity
PRNL
−
5
10
%
2
Die
Photoresponse Non-Uniformity
PRNU
−
8.5
25
% p−p
3
Die
VDARK,READ
−
18
30
mV/s
4
Die
VDARK,INT
−
3
10
mV/s
5
Die
DSNU
−
1
4
mV p−p
6, 16
Die
Dark Signal Doubling Temperature
DT
−
5.7
−
°C
4
Design
Read Noise
NR
−
12.5
−
e− rms
7
Design
Dynamic Range
DR
−
70.2
−
dB
8
Design
DRLIN (Est.)
−
69.3
−
dB
RGHueUnif
BGHueUnif
−
−
5
5
12
12
%
Horizontal Charge Transfer
Efficiency
HCTE
−
0.999995
−
Vertical Charge Transfer Efficiency
VCTE
−
0.999999
−
XAB
−
800
DC Offset, Output Amplifier
VODC
−
7.5
Output Amplifier Bandwidth
f−3dB
−
220
Description
Readout Dark Signal
Integration Dark Signal
Dark Signal Non-Uniformity
Estimated Linear Dynamic Range
Red-Green Hue Shift
Blue-Green Hue Shift
(Color Version)
Blooming Protection
www.onsemi.com
8
% QE
Design
% QE
Design
Design
9
Die
10
Design
x Esat
11
Design
−
V
12
Die
−
MHz
13
Design
Die
KAF−50100
Table 5. SPECIFICATIONS (continued)
Description
Symbol
Min.
Nom.
Max.
Units
Output Impedance, Amplifier
ROUT
−
145
−
W
Reset Feedthrough
VRFT
−
0.5
−
V
Notes
Verification
Plan15
Die
14
Design
1. Increasing output load currents to improve bandwidth will decrease these values.
2. Worst-case deviation (from 15 mV & 90% NSAT min) relative to a linear fit applied between 0 and 65% of VSAT.
3. Difference between the maximum and minimum average signal levels of 168 × 168 blocks within the sensor on a per color basis as a % of
average signal level.
4. T = 60°C. tINT = 0. Average non-illuminated signal with respect to over-clocked horizontal register signal.
5. T = 60°C. Average non-illuminated signal with respect to over-clocked vertical register signal.
6. T = 60°C. Absolute difference between the maximum and minimum average signal levels of 168 × 168 blocks within the sensor.
7. rms deviation of horizontal over-clocked pixels measured in the dark.
8. 20Log (Ne−SAT / NR)
9. Gradual variations in hue (red with respect to green pixels and blue with respect to green pixels) in regions of interest (168 × 168 blocks)
within the sensor. The specification refers to the largest value of the response difference.
10. Measured per transfer above and below (~70% VSAT min) saturation exposure levels. Typically, no degradation in HCCD CTE is observed
up to 18 MHz.
11. XAB is the number of times above the VSAT illumination level that the sensor will bloom by spot size doubling. The spot size is 10% of the
imager height. XAB is measured at 4 ms.
12. Video level offset with respect to ground.
13. Last stage only. Assumes 5 pF off-chip load.
14. Amplitude of feed-through in VOUT during RG clocking.
15. A “die” parameter is measured on every sensor during production testing. A “design” parameter is quantified during design verification and
not guaranteed by specification.
16. tINT = 1,000 ms
www.onsemi.com
9
KAF−50100
TYPICAL PERFORMANCE CURVES
KAF−50100 Spectral Response
25
Absolute Quantum Effeciency (%)
R
20
G
B
15
10
5
0
350
400
450
500
550
600
650
700
750
800
850
900
950
1,000 1,050 1,100
Wavelength (nm)
Figure 7. Spectral Response (KAF−50100−CAA Version)
KAF−50100 Monochrome Quantum Efficiency
30
Absolute Quantum Effeciency (%)
25
20
15
10
5
0
350
400
450
500
550
600
650
700
750
800
850
900
950
Wavelength (nm)
Figure 8. Spectral Response (KAF−50100−AAA Version)
www.onsemi.com
10
1,000 1,050 1,100
KAF−50100
KAF−50100−ABA Monochrome with Lens QE
70
Absolute Quantum Effeciency (%)
60
50
40
30
20
10
0
350
400
450
500
550
600
650
700
750
800
850
900
950
1,000 1,050 1,100
Wavelength (nm)
Figure 9. Spectral Response (KAF−50100−ABA Version)
KAF−50100 Quantum Efficiency GR − GB Difference
1.2
1.0
Absolute GR−GB QE Difference
0.8
0.6
0.4
0.2
0.0
−0.2
−0.4
−0.6
350
400
450
500
550
600
650
700
750
800
850
900
950
1,000 1,050 1,100
Wavelength (nm)
Figure 10. Typical GR − GB QE Difference (KAF−50100−CAA Version)
www.onsemi.com
11
KAF−50100
KAF−50100 − Typical Angular Response
1
0.9
Normalized Response
0.8
0.7
0.6
0.5
0.4
Vertical
0.3
Horizontal
0.2
Cosine
0.1
0
−40
−20
0
20
40
Incident Light Angle (Deg)
Figure 11. Typical Normalized Angle Response (KAF−50100−CAA Version)
KAF−50100 Monochrome − Typical Angular Response
1
0.9
Normalized Response
0.8
0.7
0.6
0.5
0.4
Vertical
0.3
Horizontal
0.2
Cosine
0.1
0
−40
−30
−20
−10
0
10
20
30
Incident Light Angle (Deg)
Figure 12. Typical Normalized Angle Response (KAF−50100−AAA Version)
www.onsemi.com
12
40
KAF−50100
KAF−50100−ABA Monochrome with Lens
1.1
1
0.9
0.7
0.6
0.5
0.4
0.3
0.2
Horizontal
0.1
Vertical
0
−40
−30
−20
−10
0
10
20
30
Incident Light Angle (Deg)
Figure 13. Typical Normalized Angle Response (KAF−50100−ABA Version)
KAF−50100 Anti-Blooming Performance
6,000
5,000
4,000
XAB
Normalized Response
0.8
3,000
2,000
1,000
0
0
5
10
15
20
Integration Time (ms)
Figure 14. Typical Anti-Blooming Performance
www.onsemi.com
13
25
40
KAF−50100
DEFECT DEFINITIONS
Operating Conditions
Bright defect tests performed at T = 25°C, tINT = 250 ms and tREADOUT = 2,527 ms.
Dark defect tests performed at T = 25°C, tINT = 1,000 ms and tREADOUT = 2,527 ms.
Table 6. SPECIFICATIONS
Classification
Points
Clusters
Columns
Includes Dead Columns
Standard Grade
< 4,000
< 50
< 20
Yes
A column that deviates by more that 1.5% above or below
neighboring columns under illuminated conditions.
Point Defects
A pixel that deviates by more than 36 mV above
neighboring pixels under non-illuminated conditions.
A pixel that deviates by more than 7% above or 11%
below neighboring pixels under illuminated conditions
Column defects are separated by no less than 4 good
columns. No multiple column defects (double or more) will
be permitted.
Cluster Defect
A grouping of not more than 10 adjacent point defects.
Column and cluster defects are separated by at least 4
good columns in the x direction.
Cluster defects are separated by no less than 4 good pixels
in any direction.
Dead Column
A column that deviates by more than 50% below
neighboring columns under illuminated conditions.
Column Defect
A grouping of more than 10 point defects along a single
column.
Saturated Column
A column that deviates by more than 120 mV above
neighboring columns under non-illuminated conditions. No
saturated columns are allowed.
A column that deviates by more that 1.2 mV above
neighboring columns under non-illuminated conditions.
www.onsemi.com
14
KAF−50100
OPERATION
Table 7. ABSOLUTE MAXIMUM RATINGS
Description
Symbol
Minimum
Maximum
Units
Notes
Diode Pin Voltages
VDIODE
−0.5
20
V
1, 2
Gate Pin Voltages
VGATE1
−14.3
14.5
V
1, 3
RG Pin Voltage
VRG
−0.5
14.5
V
1
Overlapping Gate Voltages
V1−2
−14.3
14.5
V
4
Non-Overlapping Gate Voltages
Vg−g
−14.3
14.5
V
5
Output Bias Current
IOUT
−
−30
mA
6
LOD Diode Voltage
VLODT
−0.5
13.5
V
1
TOP
0
60
°C
7
Operating Temperature
Stresses exceeding those listed in the Maximum Ratings table may damage the device. If any of these limits are exceeded, device functionality
should not be assumed, damage may occur and reliability may be affected.
1. Referenced to pin VSUB.
2. Includes pins: RD, VDD, VSS, VOUT.
3. Includes pins: V1, V2, H1A, H1B, H1L, H2, OG, PFG, FDG, XG.
4. Voltage difference between overlapping gates. Includes: V1 to V2, H1/H1L to H2, H1L to OG, V1 to H2, PFG to V1/V2, FDG to V1/V2, XG
to H1A/H1B/H2.
5. Voltage difference between non-overlapping gates. Includes: V1 to H1A/H1B/H1L, V2 to XG, H2 to PFG/FDG, PFG to FDG.
6. Avoid shorting output pins to ground or any low impedance source during operation. Amplifier bandwidth increases at higher currents and
lower load capacitance at the expense of reduced gain (sensitivity). Operation at these values will reduce MTTF (Mean Time to Failure).
7. Noise performance will degrade at higher temperatures.
Power-up Sequence
The sequence chosen to perform an initial power-up is not
critical for device reliability. A coordinated sequence may
minimize noise and the following sequence is
recommended:
1. Connect the ground pins (VSUB).
2. Supply the appropriate biases and clocks to the
remaining pins.
Table 8. DC BIAS OPERATING CONDITIONS
Symbol
Minimum
Nominal
Maximum
Units
Maximum DC
Current (mA)
Notes
Reset Drain
VRD
11.3
11.5
11.7
V
IRD = 0.01
1
Output Amplifier Return
VSS
0.5
0.7
1.0
V
ISS = 3.0
1
Output Amplifier Supply
VDD
14.5
15.0
15.5
V
IOUT + ISS
1
Substrate
VSUB
−
0
−
V
0.01
Output Gate
VOG
−2.2
−2.0
−1.8
V
0.01
1
Lateral Drain
VLOD
9.8
10.0
10.2
V
0.01
1
Video Output Current
IOUT
−
5
10
mA
Description
1. Subscripts (L, R, LA, LB, RA, RB, T, B) have not been included in the symbol list.
2. An output load sink must be applied to VOUT to activate output amplifier – see Figure 4.
www.onsemi.com
15
2
KAF−50100
AC Operating Conditions
Table 9. CLOCK LEVELS
Pin Description
for Clocked Signal
Symbol
Level
Min.
Nom.
Max.
Units
Effective
Capacitance (Note 1)
Notes
V1 (4 Pins Total)
V1L
Low
−9.2
−9.0
−8.8
V
568 nF
2
V1H
High
2.3
2.5
2.7
V
568 nF
2
V2L
Low
−9.2
−9.0
−8.8
V
645 nF
2
V2H
High
3.3
3.5
3.7
V
645 nF
2
V2 (4 Pins Total)
H1AL and H1AR
H1BL and H1BR
H1LL and H1LR
H2L and H2R
RGL and RGR
PFG (2 Pins Total)
FDG (2 Pins Total)
XG
H1L
Low
−4.2
−4.0
−3.8
V
491 pF
2
H1H
High
1.8
2.0
2.2
V
491 pF
2
H1L
Low
−4.2
−4.0
−3.8
V
541 pF
2
H1H
High
1.8
2.0
2.2
V
541 pF
2
H1LLOW
Low
−6.2
−6.0
−5.8
V
17 pF
2
H1LHIGH
High
1.8
2.0
2.2
V
17 pF
2
H2L
Low
−4.2
−4.0
−3.8
V
1,025 pF
2
H2H
High
1.8
2.0
2.2
V
1,025 pF
2
VRGL
Low
0.8
1.0
1.2
V
15 pF
2
VRGH
High
7.8
8.0
8.2
V
15 pF
2
PFGL
Low
−9.2
−9.0
−8.8
V
322 nF
2
PFGH
High
4.8
5.0
5.2
V
322 nF
2
FDGL
Low
−9.2
−9.0
−8.8
V
120 pF
2
FDGH
High
4.8
5.0
5.2
V
120 pF
2
XGL
Low
−4.7
−4.5
−4.3
V
265 pF
2
XGH
High
2.8
3.0
3.2
V
265 pF
2
1. All pins shown are expected to draw less than 10 mA DC current. Capacitance values relative to SUB (substrate).
2. Pins with the same name are nominally tied together on the circuit board and have the same operating conditions. For pin description entries
with more than one pin for this clocked signal, the capacitance value shown is for all pins in the row tied together.
www.onsemi.com
16
KAF−50100
TIMING
Table 10. REQUIREMENTS AND CHARACTERISTICS
Description
Symbol
Min.
Nom.
Max.
Units
Notes
H1, H2 Clock Frequency
fH
−
−
18
MHz
1, 2
V1, V2 Clock Frequency
fV
−
−
25
kHz
1, 2
V1−V2 Cross-over
VVCR
0
1.0
2.7
V
H1−H2 Cross-over
VHCR
−2.0
−1.0
0
V
H1, H2 Setup Time
tHS
5
−
−
ms
V2−H1A Delay
tD1
5
−
−
ms
H1A−XG Delay
tD2
30
−
−
ms
XG−V2 Delay
tD3
5
−
−
ms
H1, H2 Rise, Fall Times
tH1r, tH1f
5
−
10
%
5, 6
H1L Rise − H2 Fall Cross-over
VH1LCR
−2.0
−1.0
1.0
V
9
V1, V2 Rise, Fall Times
tV1r, tV1f
5
−
10
%
5
RG Clock Pulse Width
tRGw
5
−
−
ns
7
tRGr, tRGf
5
−
10
%
5
tVw
20
−
−
ms
2, 3, 4
2
RG Rise, Fall Times
V1, V2 Clock Pulse Width
Pixel Period (1 Count)
te
55.56
−
−
ns
H1L−VOUT Delay
tHV
−
10
−
ns
RG−VOUT Delay
tRV
−
5
−
ns
tREADOUT − DS
tREADOUT − DPS
1.71
0.98
−
−
−
−
s
8
tF − DS
tF − DPS
0.6
1.0
−
−
−
−
fps
8
tLINEDS − DS
tLINEDP − DPS
275.7
315.7
−
−
−
−
ms
8
PFG Holdoff Time
tPFG
180
−
−
ms
FDG Holdoff Time
tFDG
20
−
−
ms
Readout Time
Frame Rate
Line Rate
1.
2.
3.
4.
5.
6.
7.
8.
9.
50% duty cycle values.
CTE will degrade above the maximum frequency.
Longer times will degrade noise performance.
Measured where VCLOCK is at 0 V.
Relative to the pulse width (based on 50% of high/low levels).
The maximum specification or 10 ns whichever is greater based on the frequency of the horizontal clocks.
RG should be clocked continuously.
DS = Dual Split DPS = Dual Parallel Split.
The charge capacity near the output could be degraded if the voltage at the clock crossover point is outside this range.
www.onsemi.com
17
KAF−50100
Edge Alignment
Horizontal Clock
H1AL/H1AR/H1BL/H1BR
H2L/H2R
VHCR
Vertical Clock
V2
V1
VVCR
Figure 15. Timing Edge Alignment
www.onsemi.com
18
KAF−50100
Frame Timing
Dual-Parallel Split timing reads pixels out of all four outputs
with even lines reading out of VOUTLA and VOUTRA and
odd lines reading out of VOUTLB and VOUTRB.
Dual split timing reads the pixels out of VOUTLA and
VOUTRA. H1B may be grounded in this operating mode.
Frame Timing − Dual Split
tINT
V1
V2
tREADOUT
Line
1
2
6219
3
6220
H1A/B/L
H2
XG
Frame Timing − Dual-Parallel Split
tINT
V1
V2
tREADOUT
Line Pair
1
3
2
3109
3110
H1A
XG
H1B/L
H2
Figure 16. Frame Timing
Frame Timing Detail
Vertical Clocks
V1
V1HIGH
90%
tV
10%
tV1r
V1LOW
tV1f
V2
90%
V2HIGH
tV
10%
tV2r
tV2f
Figure 17. Frame Timing Detail
www.onsemi.com
19
V2LOW
KAF−50100
Line Timing (Each Output)
H1A (tD2), and then passed through XG (tD3) and into H1B.
During this time, the second, full resolution, row will load
into H1A at the second falling edge of V2 following the
characteristic delay tHD.
XG is held low unless the Dual-Parallel Split timing is
required. While operating in Dual-Parallel Split mode, full
resolution rows are passed from V2 (tD1), through
Line Timing − Dual Split
t LINE
tV
tV
t HS
V1
V2
H1A/B/L
4152 Counts
H2
XG
Line Timing − Dual-Parallel Split
t LINE
tV
tV
tV
t D3
t HS
V1
V2
H1A
XG
t D1
H1B/L
t D2
tV
4152 Counts
H2
Figure 18. Line Timing
www.onsemi.com
20
KAF−50100
Pixel Timing
te
H1A/B/L
H2
RG
VOUT
Figure 19. Pixel Timing
Pixel Timing Detail
Reset Clock
RGHIGH
RGL/RGR
90%
tRGw
VRG
10%
RGLOW
tRGr
tRGf
Horizontal Clocks
H1AHIGH/
H1BHIGH/
H2HIGH
H1AR/H1BR/H2R/
H1AL/H1BL/H2L
90%
50%
te / 2
10%
tHr
tHf
H1LHIGH
H1LR/H1LL
H1ALOW/
H1BLOW/
H2LOW
90%
50%
te / 2
10%
tHr
tHf
Figure 20. Pixel Timing Detail
www.onsemi.com
21
H1LLOW
KAF−50100
MODE OF OPERATION
Power-Up Flush Cycle
Pulse Flush Gate Timing
The PFG clock resets all pixels in the array (except the
FDG row). Charge transfer out of the pixel is fully
completed only after V2 has been clocked low as shown.
Frame Timing − Pulse Flush Operation
tINT
tFLUSH
tREADOUT
V1
V2
tV
PFG
tPFG
Figure 21. Pulse Flush Gate Timing
time period (tFDG). The position of the FDG row is
illustrated in Figures 23–25, including the timing required
for a simple 1 line dump operation. Pixels colored in yellow
represent dumped pixels.
Fast Dump Gate (FDG) Timing
The FDG clock only resets pixels that happen to be in the
FDG row. Charge transfer out of the pixel is fully completed
only after V2 has been clocked low plus the characteristic
Row#
4
3
2
Fast Dump Gate Row
1
Bottom LOD Contact Row
HCCD Register A
HCCD Register B
Figure 22. Fast Line Dump Layout
Line Timing − Fast Dump Gate
tFDG
V1
V2
FDG
H1
4152 Counts
H2
t0
t1
t2
t3
t4
t5
Figure 23. One Line Dump Timing Example
www.onsemi.com
22
KAF−50100
Line Timing − Fast Dump Gate (3 Line Dump)
tV
tV
tFDG
V1
V2
FDG
H1
4152 Counts
H2
Figure 24. Line Dump Timing Example
t0
4
VCCD
4
3
FDG
LOD
2
1
V2
V1
V2
V1
V2
V1
V2
V1
V2
t1
GR4
B4
GR4
B4
R3
GB3
R3
GB3
GR2
B2
GR2
B2
R1
GB1
R1
GB1
GR4
B4
GR4
B4
R3
GB3
R3
GB3
GR2
R1
B2
GB1
t3
t2
GR2
R1
GR4
B4
GR4
B4
R3
GB3
R3
GB3
GR4
B4
GR4
B4
R3
GB3
R3
GB3
B2
t5
t4
GR4
B4
GR4
B4
R3
GB3
R3
GB3
R1
GB1
R1
GB1
GB1
R1
GB1
R1
B4
GR4
B4
R3
GB3
R3
GB3
R1
GB1
R1
GB1
GB1
R1
V1
V2
HCCD A
GB1
R1
GB1
XG
HCCD B
NOTE: Areas highlighted in yellow represent pixels drained of charge.
Figure 25. One Line Dump Pixel Illustration using Color Filter Designation
www.onsemi.com
23
GR4
KAF−50100
MECHANICAL DRAWINGS
Completed Assembly
Notes:
1. Device marking for the monochrome no-lens version is “KAF−50100−AAA”.
2. Device marking for the monochrome version with lens is “KAF−50100−ABA”.
Figure 26. Completed Assembly Drawing
Cover Glass Specification − MAR
1. Substrate material Schott D263T eco or equivalent.
2. 10 mm max. scratch/dig specification on the glass. No defect in the glass that exceeds 10 mm in any X−Y dimension.
3. Multilayer anti-reflective coating.
Table 11. COVER GLASS SPECIFICATION − MAR
Wavelength
Total Reflectance
420−450
≤ 2%
450−630
≤ 1%
630−680
≤ 2%
Cover Glass Specification − CLEAR
1. Substrate material Schott D263T eco or equivalent.
2. 10 mm max. scratch/dig specification on the glass. No defect in the glass that exceeds 10 mm in any X−Y dimension.
www.onsemi.com
24
KAF−50100
Table 12. COVER GLASS SPECIFICATION − CLEAR
Wavelength
Total Reflectance
420−450
≤ 10%
450−630
≤ 10%
630−680
≤ 10%
REFERENCES
For information on ESD and cover glass care and
cleanliness, please download the Image Sensor Handling
and Best Practices Application Note (AN52561/D) from
www.onsemi.com.
For information on device numbering and ordering codes,
please download the Device Nomenclature technical note
(TND310/D) from www.onsemi.com.
For information on Standard terms and Conditions of
Sale, please download Terms and Conditions from
www.onsemi.com.
For information on soldering recommendations, please
download the Soldering and Mounting Techniques
Reference
Manual
(SOLDERRM/D)
from
www.onsemi.com.
For quality and reliability information, please download
the Quality & Reliability Handbook (HBD851/D) from
www.onsemi.com.
ON Semiconductor and the
are registered trademarks of Semiconductor Components Industries, LLC (SCILLC) or its subsidiaries in the United States and/or other countries.
SCILLC owns the rights to a number of patents, trademarks, copyrights, trade secrets, and other intellectual property. A listing of SCILLC’s product/patent coverage may be accessed
at www.onsemi.com/site/pdf/Patent−Marking.pdf. SCILLC reserves the right to make changes without further notice to any products herein. SCILLC makes no warranty, representation
or guarantee regarding the suitability of its products for any particular purpose, nor does SCILLC assume any liability arising out of the application or use of any product or circuit, and
specifically disclaims any and all liability, including without limitation special, consequential or incidental damages. “Typical” parameters which may be provided in SCILLC data sheets
and/or specifications can and do vary in different applications and actual performance may vary over time. All operating parameters, including “Typicals” must be validated for each
customer application by customer’s technical experts. SCILLC does not convey any license under its patent rights nor the rights of others. SCILLC products are not designed, intended,
or authorized for use as components in systems intended for surgical implant into the body, or other applications intended to support or sustain life, or for any other application in which
the failure of the SCILLC product could create a situation where personal injury or death may occur. Should Buyer purchase or use SCILLC products for any such unintended or
unauthorized application, Buyer shall indemnify and hold SCILLC and its officers, employees, subsidiaries, affiliates, and distributors harmless against all claims, costs, damages, and
expenses, and reasonable attorney fees arising out of, directly or indirectly, any claim of personal injury or death associated with such unintended or unauthorized use, even if such claim
alleges that SCILLC was negligent regarding the design or manufacture of the part. SCILLC is an Equal Opportunity/Affirmative Action Employer. This literature is subject to all applicable
copyright laws and is not for resale in any manner.
PUBLICATION ORDERING INFORMATION
LITERATURE FULFILLMENT:
Literature Distribution Center for ON Semiconductor
19521 E. 32nd Pkwy, Aurora, Colorado 80011 USA
Phone: 303−675−2175 or 800−344−3860 Toll Free USA/Canada
Fax: 303−675−2176 or 800−344−3867 Toll Free USA/Canada
Email: [email protected]
N. American Technical Support: 800−282−9855 Toll Free
USA/Canada
Europe, Middle East and Africa Technical Support:
Phone: 421 33 790 2910
Japan Customer Focus Center
Phone: 81−3−5817−1050
www.onsemi.com
25
ON Semiconductor Website: www.onsemi.com
Order Literature: http://www.onsemi.com/orderlit
For additional information, please contact your local
Sales Representative
KAF−50100/D