Catalog

2016 Edition
Optical Gauge Series
Optical NanoGauge / Optical MicroGauge
Optical NanoGauge
NEW
C13027
C11295
P6
Ultrathin film measurement
with high speed
10 nm
C10178
P14
P12
Extensibility type for
research laboratory
Multipoint
measurement
Glass
100 μm
20 nm
Glass
100 μm
20 nm
Glass
50 μm
0.5 μm
300 μm
Glass
25 μm
Glass
2900 μm
Sample thickness
100 nm
1 μm
10 μm
Optical NanoGauge
C10323
Microscope type
NanoGauge
P16
100 μm
1 mm
Optical MicroGauge
C12562
Embedded type
in 1Box unit
P10
C11011
P18
Thick film measurement
with high speed
* The refractive indices in this catalog are 1.5 for glass and 3.67 for silicon.
Roll-to-roll film production
Example: In-line measurement settings for film coating system
Optical MicroGauge
Thickness measurement system
C11011
Optical NanoGauge
Thickness measurement system
C12562/C13027
Multipoint NanoGauge
Thickness measurement system
C11295
Cutting, Roll-up
Coating layer
Plastic film, Bonding layer, ITO, Wet film
Measurement after
drying and curing
Drying, Curing
Coating, Deposition (PVD/CVD)
Film thickness, Coated layer thickness, Total thickness
Let-off
Example: In-line measurement settings for PVD/CVD system
Multipoint NanoGauge
Thickness measurement system
C11295
Flange
Reflectivity measurement
Transmission measurement
Chromaticity
Film thickness
measurement
Evaporation film
(PVD/CVD)
ITO, SiOx, NbO
Both surface analysis
Vacuum
chamber
Inside/outside of vacuum chamber is isolated by vacuum flange.
Inside vacuum chamber, up to 15 vacuum fibers with 3 m max
length can be installed.
Max. 15 points
* Please consult us for more details.
Vacuum conditions
- Vacuum level: 10-5 Pa
- Environment temp: Less than +80 ˚C
Transmittance measurement
is available.
* The bending radius of the fiber in a vacuum is R100 mm or more.
High measurement stability for focus and angular fluctuations
No difficulty involved in designing
a measurement system
Short down time for maintenance
No adjustment jig necessary
Angular
fluctuation
Defocus
Stability for focus
Stability for angular fluctuations
700 nm SiO2 film measurement example
700 nm SiO2 film measurement example
Focus dependence versus reference point: ±3 mm (1 mm pitch), WD of reference point: 10 mm
Position
Optical NanoGauge
Typical thickness measuring device
-3 mm
701.59 nm
698.39 nm
-2 mm
701.63 nm
699.92 nm
-1 mm
701.66 nm
701.13 nm
Reference point
701.65 nm
702.37 nm
+1 mm
701.66 nm
703.51 nm
+2 mm
701.67 nm
704.74 nm
+3 mm
701.65 nm
705.91 nm
Angular dependence versus reference point: 0 degrees to 5 degrees, WD of reference point: 10 mm
Variation amount (nm)
Variation amount (nm)
3
2
1
Amount of vertical movement (mm)
0
-3
-2
-1
0
1
2
3
-1
-2
-3
Optical NanoGauge
Typical thickness measuring device
At a vertical movement of 6 mm, the Optical NanoGauge
has variations below
Cost
reduction
0.1 nm,
while a typical thickness
measuring device exhibits variations up to 8 nm.
Incident angle
Optical NanoGauge
Typical thickness measuring device
0 degrees
702.23 nm
702.47 nm
3 degrees
702.29 nm
703.70 nm
5 degrees
702.62 nm
709.38 nm
10
8
6
Optical NanoGauge
Typical thickness measuring device
4
2
0
-2
0
3
5
Incident angle (degrees)
During angular movement from 0 degrees to 5 degrees,
the Optical NanoGauge has variations 0.39
nm (0.047 %)
while a typical thickness measuring device exhibits variations up to 5 nm or more.
3
Example applications
The Optical Gauge series can be used in each process in a variety of manufacturing settings.
Highly functional films are becoming ever more essential to
cutting-edge industries that make liquid crystal displays,
rechargeable batteries, solar panels, and a host of other products.
To boost the performance and productivity of those products
Hamamatsu offers a full line-up of inspection and testing
equipment.
Touch panel
A touch panel is the key factor in today's hottest digital products
such as smart phones, tablets, digital cameras' liquid crystal
displays, and advanced gaming systems. Although there are
various detection schemes for touch panels, the resistive film
manufacturing process is used here as an example to show how
the Optical Gauge series is used in such a process.
Semiconductor
Film production pre-process
Dissolving raw materials
Flow casting
Longitudinal stretching
Transverse stretching
Thermal treatment and Roll-up
C11011
C11011
C11011
C11011
C12562
C12562
C11011
Glass substrate production process (Electrostatic Capacitive touch panel)
Receiving substrate
ITO Patterning
Etching
Backside ITO Patterning
Neighboring circuit
making
C11011
C13027/C11295
C13027/C11295
C13027/C11295
Wafer production process
Ingot production
Cut ingot
Pre-process
Photoresist
coating
Wafer polishing Wafer oxidizing
The Optical Gauge series is used in the various manufacturing
processes of semiconductor devices in which metal wiring is more
multilayered, processes are increasingly miniaturized, and lower
voltage is used. This contributes to improvement in the yield and
shortens the time required to start a process.
Lithography
Etching
C13027/C11295
C13027/C11295
Silicon
Oxidizing,
planarization Diffusion, Coating
Repeat
C11011
Ion implantation
Cleaning
Repeat
Film
C13027/C11295
Secondary battery
Electrode plate
production
Electrode coil winding
Coating
The demand for secondary batteries, such as lithium ion, is rapidly
increasing not only due to their use in personal computers and cell
phones, but also with the development of electric vehicles and
hybrid electric vehicles. The research and development of more
efficient products are ongoing. The Optical Gauge series can be
used in a wide range of processes in the manufacture of secondary
batteries, contributing to promoting shorter tact time.
FPD
Roll press
Crush/mixture
Slitter
Drying
C10178
C10178
C11011
For NIR model
C10178
C11011
For NIR model
Color filter process
Glass substrate
Coating
Inspection,
Repair
Resist coating
Cleaning
C11011
C11011
For NIR model
Array process
The Optical Gauge series can be used in a wide range of
processes in the manufacture of FPD(flat-panel display) such as
liquid crystal, LED, organic EL, VFD fluorescent display tube and
plasma display.
Separator
Drying
Color filter substrate Alignment film
production process
coating
Rubbing
Etching
C10323
C13027/C11295
C13027/C11295
For transmission measurement model
PV
Solar power generation is expanding continuously as a growing
industry for the reduction of greenhouse gas emissions and other
features. Also, many companies are engaging in research for
improving the conversion efficiency of the solar cell or modules
used in power generation. The Optical Gauge series can be used
in a wide range of processes in the manufacture of solar cell or
modules.
Crystalline silicon PV production process
Silicon ingot
Texture formation
C11011
AR coat formation
Electrode formation
Heat sintering
C13027/C11295
CIGS PV production process
Glass substrate
C11011
4
Silicon slice
Cleaning
MO
electrode formation
Patterning
Cu-Ga film
formation
In film
formation
Film
Coating film
Plastic film
Object color
Film production back end process
Preprocessing for coatings
Coating
Drying and Curing
Let-off
Cutting and Roll-up
C13027/C12562/C11295
C11011
AR coating, PET, Coating layer, PE, PMMA
Coating film, Evaporation film, Functionality film, Ag Nanowire
Acrylic resin, Video head
C11011
C12562
C12562
Etching
Semiconductor material
Production process
Glass substrate production process
Heat-sealing
Neighboring circuit
making
Film on a wafer
Thin film
Bonding film
Inspection
C13027/C11295
C11011
C12562
Metal-oxide coating such as SiO2, SiC, Si and TiO2
Nitride coating, Wet film, Resist coating
Polished silicon, Optical disk, DLC, Carbon
Flexible printed substrate
Back end process
Electrode
formation
Wafer
inspection
Wafer
polishing
Wafer
dicing
Wire
bonding
Product
inspection
Multipoint measurement
Simultaneous measurement in multiple
chamber
In-line, in-situ measurement of APC
Mold
Tester
Stealth dicing
C11011
C11011
C12562
Assembly process
Stacking
Micro measurement
Inspection process
Discharge
and charge
Patterned semiconductor
Patterned FPD
MEMS
Sorting
Metal-oxide coating such as TiO2
Film with filler
Resist coating, Oxide film, Nitrogen film
Cell process
Module process
Alignment film
Spacer
coating
spraying
Seal material
coating
C13027/C11295
Sealing
Bonding
LC
implantation
Sealing
Bonding
polarizing plate
Mount
backlight
Dynamic operating
inspection
FPD
Film thickness and color measurement
of flat panel
C11011
Mapping
measurement
Quality control
inspection
Cell gap, Organic EL film, Alignment film, TFT, Ag Nanowire
ITO, MgO, Resist film on glass substrate
Polyimide, High-functioning film and Color film for FPD
Modularization
In-situ measurement
Film formation process monitor
Dry and wet etching measurement
Process feed gas
C13027/C11295
CIGS film
formation
CdS buffer layer
formation
Patterning
Transparent
electrode formation
Patterning
Sealing
Quality control
inspection
Film formation
process
Process exhaust gas
Metal-oxide coating such as SiO2 and Si
C13027/C11295
C13027/C11295
5
NEW
Optical NanoGauge Thickness measurement system
C13027
This new model supports connections to a PLC and easily installs
in production equipment
Ultrathin film measurement
with high speed
The Optical NanoGauge Thickness measurement system C13027 is a
non-contact film thickness measurement system utilizing spectral
interferometry. The C13207 not only supports PLC connections but is also
designed more compact than our other models for easy installation into
equipment. Our Optical Gauge series is capable of measuring the thickness
of extremely thin films down to 10 nm as well as covering a wide range of
film thickness from 10 nm up to 100 μm. The Optical Gauge series also
makes rapid measurements up to 200 Hz and so is ideal for measurements
on high-speed production lines.
10 nm
100 μm
Glass
Measurable
range
100 nm
1 μm
10 μm
100 μm
1 mm
10 nm to 100 μm thin film high speed measurement
Feature
1
Feature
2
Feature
3
Feature
4
Feature
5
Feature
6
Supports PLC connections
Shortening of cycle time (max. 200 Hz)
Capable of measuring 10 nm thin films
Simultaneously measure thickness and color
Downsized (footprint reduced by 30 % compared to C12562)
Covers broad wavelength range (400 nm to 1100 nm)
Feature
7
Feature
8
Feature
9
Feature
10
Feature
11
Simplified measurement is added to the
software
Capable of both surface analysis
Precise measurement of fluctuating film
Analyze optical constants (n, k)
Mapping function
Specification
Type number
Measurement film thickness range (glass) *1
Measurement reproducibility (glass) *2 *3
Measurement accuracy *3 *4
0.02 nm
±0.4 %
Light source
Halogen light source
Measurement wavelength range
400 nm to 1100 nm
Spot size *3
Approx. φ1 mm
Working distance *3
Number of measurable layers
Analysis
External communication interface
Analog output
Output signal Alarm output
Warning output
Input signal
10 mm
Max. 10 layers
FFT analysis, Fitting analysis, Optical constant analysis, Color analysis
Measurement time *5
Measurement start signal
Power supply voltage
Power consumption
Light guide connector shape
6
C13027-11
10 nm to 100 μm
3 ms/point
RS-232C or Ethernet
0 V to 10 V / High impedance 3-channel (up to 3 layers)
TTL / High impedance 1-channel
TTL / High impedance 1-channel
TTL / High impedance 1-channel
AC 100 V to AC 240 V, 50 Hz/60 Hz
Approx. 80 VA
FC
*1: When converted with the refractive index of glass = 1.5.
*2: Standard deviation (tolerance) when measuring 400 nm thick glass film.
*3: Depending on optical system or objective lens magnification to be used.
*4: Range of measurement guarantee as recorded in the VLSI Standards measurement guarantee document.
*5: Shortest exposure time
Configuration example
C13027 standard system (Off-line)
C13027 standard system (In-line)
Optical NanoGauge
Thickness measurement system
C13027
Standard
Option
Standard
Option
Data analyzer
Film thickness
measurement
software
Sample
Film thickness
measurement
software
RS-232C/Ethernet
Sample
Sample stage
Monitor, keyboard
and mouse
Manufacturing equipment
(i.e., etching or film forming equipment)
Optical NanoGauge
Thickness measurement system
C13027
Option
Sample stage for Optical NanoGauge
A10192-10
Data analyzer Laptop type
C10471-21
Sample stage FC connector type for VIS
A10192-05
Mapping stage φ200 mm C8126-31
Mapping stage φ300 mm C8126-32
This stage accommodates samples up to φ200 mm
in diameter. Light condenser not included. This is a
pen type model of the A10192-04, designed to view
samples more easily.
WD: approx. 10 mm
Measurement spot diameter: φ1 mm
Conventional model A10192-04 is available.
(Refer to page 11)
This stage accommodates samples up to φ200 mm
in diameter. It comes with a visible-light condenser
lens with corrected chromatic aberration.
WD: approx. 35 mm
Measurement spot diameter: φ1.5 mm
Macro optics FC connector type for VIS
A10191-03
Laptop type data analyzer is available
as an option.
Measurement time: 2 s/point
Measurement area: Up to 140 mm square (C8126-31)
<4 inch to 8 inch wafer>
: Up to 200 mm square (C8126-32)
<4 inch to 12 inch wafer>
Stage movement resolution: 0.1 mm
Stage movement repeatability: ±0.01 mm
FC Receptacle A12187-02
This receptacle is a tool for setting a fiber probe in a mount.
Visible light condenser lens for A10192-05.
WD: approx. 35 mm
Measurement spot diameter: φ1.5 mm
Lamp unit L12839-01
This receptacle lamp unit for C12562 and C13027.
Film thickness measurement software for both surface
U12708-01
Analysis software for both surface.
(Unit: mm)
Main unit (Approx. 4.7 kg)
Two split light guide
* The bending radius of the fiber
is R75 mm or more.
123.5±1
D95P connector
6
φ20
SUS-acceptable light tube
333±1
202±1
FC connector
φ12
Sample stage for Optical NanoGauge A10192-10
φ10
Dimensional outline
+50
+200
5000 -0
10±1
8±1
148±1
200 -0
75±1
150±1
130±1
280±1
7
Principle
Spectral interferometry is used to measure film thickness.
When light enters a thin film sample, multiple reflections occur
inside the thin film. These multiple-reflection light waves boost or
weaken each other along with their phase difference. The phase
difference of each multiple-reflection light is determined by the light
wavelength and optical path length (= distance that light moves
back and forth in the thin film multiplied by the film refractive index).
The number of signals is increased as the film thickness becomes
thick. The signal intervals in short wavelength range appears more
often than those in the long wavelength range.
Reflected light
Phase
difference
Incident light
This phase difference allows the spectrum reflected from or
transmitted through the sample to produce a unique spectrum that
depends on the film thickness. Spectral interferometry is a
technique for measuring film thickness by analyzing that particular
spectrum. The Optical NanoGauge utilizes spectral interferometry to
analyze a target spectrum by the curve-fitting or FFT (Fast Fourier
Transform) method that matches your application.
Thin film
Intensity
Wavelength
Intensity
Wavelength
Film
Number of signal interval increased.
Intensity
Substrate
Wavelength
Analysis by curve fitting
Thick film
For measuring less than1 μm film thickness
Interference spectrum measurement of transparent electrode (ITO film: 350 nm)
Reflectivity (%)
80
Spectral reflection factor
(measurable quantity)
60
Theoretical wave pattern
The analyzed film thickness is the theoretical value, which is
the least RMS (Root Mean Square) value of the theoretical
wave pattern and measurement reflection pattern.
40
20
500
400
600
700
Wavelength (nm)
800
Analysis by FFT (Fast Fourier Transform)
For measuring more than 1 μm film thickness
30 μm
25
22.5
Fourier transform
20
Intensity
Reflectivity (%)
Measurement of etalon (30 μm)
17.5
15
12.5
4.00
2.00
0.00
500
600
700
800
Wavelength (nm)
8
6.00
900
1000
0.1
1.0
10
Optical film thickness (μm)
100
Both surface analysis
The analysis is performed using the film thickness measurement software for both surface U12708-01. (Patent pending)
Both surface analysis for both-side-coated samples
In some cases, a coating film is applied to the back side of thin film
samples. If such both-side-coated samples are measured by an
ordinary method, the fitting cannot be consistent as the effect of the
film on the back side is not taken into account, and therefore
accurate values cannot be obtained. In addition, if the thickness of
the film on the back side changes, the system cannot follow the
change during the measurement and this may largely affect
measured values.
Both-side-coated samples
*For Optical NanoGauge Thickness measurement system C13027 and C12562
Film thickness
Coating film on the surface: first layer 1
150 nm (n=2.0)
2
100 nm (n=1.5)
3
1000 nm (n=1.5)
Coating film on the surface: second layer
100 μm (n=1.7)
Coating film on the bottom surface
Both side analysis
Reflectivity
Film thickness
analysis result
1 150 nm
2 100 nm
3 1000 nm
600
800
Wavelength (nm)
Standard measurement
Measurable wave pattern (simulation)
Theoretical wave pattern
Film thickness
analysis result
Reflectivity
Board
400
Since the Optical Gauge is equipped with the both surface analysis
function as an option, which makes it possible to measure bothside-coated samples accurately measurement of both-side-coated
samples.
1000
1 143.69 nm
2 119.25 nm
3 1120.00 nm
400
600
800
Wavelength (nm)
Thickness of coating film not only
on the surface but also on the
back side is measured with high
accuracy.
1000
Errors in measured values are large.
*This is the result of a simulation using an analysis model.
When the thickness of the coating film
on the back side is increased by 100 nm
1 150 nm
2 100 nm
3 1100 nm
400
600
800
Wavelength (nm)
1000
Film thickness
analysis result
Reflectivity
Reflectivity
Film thickness
analysis result
1
2
3
400
Thickness is measured with high
accuracy, even back side film
thickness is changed.
600
800
Wavelength (nm)
147.28 nm
120.06 nm
960.00 nm
1000
Measurement errors are large,
and the values are inaccurate as
changes in the coating film on the
back side cannot be followed.
*This is the result of a simulation using an analysis model.
9
Optical NanoGauge Thickness measurement system
C12562
An integrated type designed for installation into equipment and ideal for measuring
a wide diverse range of objects from thin films to substrates and more
Embedded type
in 1Box unit
The Optical NanoGauge Thickness measurement system C12562 is a
compact, space-saving, non-contact film thickness measurement system
designed to easily install in equipment where needed. In the semiconductor
industry, measuring silicon thickness is essential due to the spread of
through-silicon via technology; and in the film production industry, adhesion
layer films are being made ever thinner to meet product specifications. So
these industries now require even higher accuracy in thickness measurements
ranging from 1 μm to 300 μm. The C12562 allows making accurate
measurements across a wide thickness range from 0.5 μm to 300 μm that
include the thin film coating and film substrate thickness as well as the total
thickness. The C12562 also offers rapid measurements up to 100 Hz making
it ideal for measurements on high-speed production lines.
0.5 μm
300 μm
Glass
Measurable
range
100 nm
1 μm
10 μm
100 μm
1 mm
One unit measures a wide variety of materials from thin films
to silicon substrates in thicknesses from 0.5 μm to 300 μm
Feature
1
Feature
2
Feature
3
Feature
4
Makes measurement ranging from thin film thickness
to the total thickness
Shortening of cycle time (max. 100 Hz)
Enhanced external triggers
(accommodates high-speed measurement)
Simplified measurement is added to the software
Feature
5
Feature
6
Feature
7
Feature
8
Capable of both surface analysis
Precise measurement of fluctuating film
Analyze optical constants (n, k)
External control available
Specification
Type number
Measurement film thickness range (glass) *1
Measurement reproducibility (glass) *2 *3
0.2 nm
Measurement accuracy *3 *4
±0.4 %
Light source
Halogen light source
Spot size *3
Approx. φ1 mm
Working distance *3
Number of measurable layers
Analysis
Measurement time *5
External communication interface
Power supply voltage
Power consumption
Light guide connector shape
10
C12562-04
500 nm to 300 μm
10 mm
Max. 10 layers
FFT analysis, Fitting analysis, Optical constant analysis
3 ms/point
RS-232C, Ethernet
AC 100 V to AC 240 V, 50 Hz/60 Hz
Approx. 80 VA
FC
*1: When converted with the refractive index of glass = 1.5.
*2: Standard deviation (tolerance) when measuring 1 μm thick glass film.
*3: Depending on optical system or objective lens magnification to be used.
*4: Range of measurement guarantee as recorded in the VLSI Standards measurement guarantee document.
*5: Shortest exposure time
Configuration example
C12562 standard system (Off-line)
C12562 standard system (In-line)
Optical NanoGauge
Thickness measurement system
C12562
Standard
Option
OPTICAL NANO GAUGE
USB3.0
USB2.0
LAN1
LAN2
Standard
Option
Film thickness
measurement
software
Data analyzer
C12562-01
MONITOR
LIGHT
POWER
AUDIO
LINE
TRIG. IN
SENSOR
Film thickness
measurement
software
Sample
RS-232C/Ethernet
OPTICAL NANO GAUGE
Sample
USB3.0
Sample stage
USB2.0
LAN1
C12562-01
LAN2
MONITOR
POWER
AUDIO
LIGHT
LINE
TRIG. IN
SENSOR
Manufacturing equipment
(i.e., etching or film forming equipment)
Monitor, keyboard
and mouse
Optical NanoGauge
Thickness measurement system
C12562
Option
Sample stage FC connector type for VIS
A10192-04
Macro optics FC connector type for VIS
A10191-03
Sample stage FC connector type for VIS
A10192-05
This receptacle is a tool for setting a fiber probe in a mount.
Visible light condenser lens for A10192-05
WD: approx. 35 mm
Measurement spot diameter: φ1.5 mm
This stage accommodates samples up to φ200 mm
in diameter. Light condenser not included.
WD: approx. 10 mm
Measurement spot diameter: φ1 mm
Pen type model A10192-10 is available.
(Refer to page 7)
FC Receptacle A12187-02
This stage accommodates samples up to φ200 mm
in diameter. It comes with a visible-light condenser
lens with corrected chromatic aberration.
WD: approx. 35 mm
Measurement spot diameter: φ1.5 mm
Lamp unit L12839-01
This receptacle lamp unit for C12562 and C13027.
Film thickness measurement software for both surface
U12708-01
Analysis software for both surface.
(Unit: mm)
Two split light guide
USB3.0
USB2.0
LAN1
LAN2
MONITOR
POWER
AUDIO
LIGHT
98.5±1
Optical NanoGauge C12562
LINE
TRIG. IN
SENSOR
408±1
150±1
10±1
FC connector
φ12
183+30 (MAX)
53 (MIN)
27
2 (MIN)
52+30 (MAX)
8±1
Sample stage FC connector type for VIS
A10192-04
75±1
SUS-acceptable light tube
6±2
292±1
D95P connector
φ10
Main unit (Approx. 7.0 kg)
φ20
Dimensional outline
+50
200 -0
+200
5000 -0
* The bending radius of the fiber is R75 mm or more.
130±1
280±1
11
Optical NanoGauge Thickness measurement system
Versatile standard type for basic research
C10178
Extensibility type for
research laboratory
The Optical NanoGauge Thickness measurement system C10178 is a
non-contact film thickness measurement system utilizing spectral
interferometry. Film thickness is measured quickly with high sensitivity and
high accuracy through spectral interferometry. As our photonic multichannel
analyzer (PMA) is used as the detector, a variety of measurement items
such as quantum yield, reflectance, transmittance and absorption can also
be measured simultaneously while measuring film thickness of various
optical filters, coating, etc.
50 μm
20 nm
Glass
Measurable
range
100 nm
1 μm
10 μm
100 μm
1 mm
Highly accurate and real time measurement of thin film
from 20 nm to 50 μm thickness
Feature
1
Feature
2
Feature
3
Feature
4
High speed and high accuracy
5
Real time measurement
6
Precise measurement of fluctuating film
Analyze optical constants (n, k)
Feature
Feature
External control available
Quantum yield, reflectance, transmittance
and absorption can be measured with
specific accessories.
Specification
Type number
visible absorption samples)
Measurement film thickness range (glass) *1
20 nm to 50 μm
150 nm to 50 μm
Measurement reproducibility (glass) *2 *3
0.01 nm
0.05 nm
Measurement accuracy *3 *4
±0.4 %
±0.4 %
Light source
Halogen light source
Halogen light source
Measurement wavelength range
400 nm to 1100 nm
900 nm to 1650 nm
Spot size
*3
Working distance *3
Number of measurable layers
Analysis
10 mm
Max. 10 layers
FFT analysis, Fitting analysis, Optical constant analysis
Measurement time *5
19 ms/point
Yes (Option)
Interface
Power supply voltage
Power consumption
Light guide connector shape
Spectral interferometry is used to measure film thickness.
When light enters a thin film sample, the sample produces a unique spectrum that
depends on the film thickness. Spectral interferometry is a technique for
measuring film thickness by analyzing that particular spectrum.
Reflected light
Incident light
Phase
difference
Intensity
Thin film
Wavelength
Intensity
Wavelength
Approx. φ1 mm
External control function
External communication interface
12
C10178-03 (NIR: supports
C10178-01
Film
Substrate
Number of signal interval increased.
Intensity
Wavelength
Thick film
RS-232C, PIPE, Ethernet
USB 2.0
AC 100 V to AC 120 V/AC 200 V to AC 240 V, 50 Hz/60 Hz
Approx. 230 VA
Approx. 250 VA
φ12 sleeve shape
*1: When converted with the refractive index of glass = 1.5.
*2: Standard deviation (tolerance) when measuring 400 nm thick glass film.
*3: Depending on optical system or objective lens magnification to be used.
*4: Range of measurement guarantee as recorded in the VLSI Standards measurement guarantee document.
*5: Shortest exposure time
Configuration example
C10178 standard system
Standard
Option
PMA-12 Photonic multichannel analyzer
Two branch light guide
VIS to NIR 2 m
A10193-02
C10027
PHOTONIC MULTI-CHANNEL ANALYZER
SIGNAL INPUT
Data analyzer Laptop type
C10471-01
Sample
Halogen lamp
L6758-11
Film thickness
measurement software
U10339-01
Sample stage
Option
Sample stage Sleeve type A10192-01
Macro optics
This stage accommodates samples up to φ200 mm
in diameter. Light condenser not included.
Sleeve type for VIS A10191-01
Visible light condenser lens for A10192-02
Sleeve type for NIR A10191-02
IR condenser lens for A10192-03.
Sample stage Sleeve type for VIS A10192-02
LED light source L11693-01
This stage accommodates samples up to φ200 mm
in diameter. It comes with a visible-light condenser
lens with corrected chromatic aberration.
WD: approx. 35 mm, Measurement spot diameter: φ1.5 mm
Wavelength: 420 nm to 720 nm
Sample stage for NIR A10192-03
Data analyzer Laptop type C10471-01
This stage accommodates samples up to φ200 mm
in diameter. It comes with a condenser lens covering
the UV to near infrared light range.
WD: approx. 35 mm, Measurement spot diameter: φ1.5 mm
Dimensional outline
Laptop type data analyzer is available as an option.
(Unit: mm)
Halogen lamp L6758-11 (Approx. 2.6 kg)
PMA-12 Photonic multichannel analyzer (Approx. 5 kg)
C10027
9.7±0.5
262±1
383±2
80
SIGNAL INPUT
130
99±1
C10028-01 (NIR model)
20
188
0
φ10 -0.1
φ7
50±0.2
0
φ10 -0.1
50±0.2
5
300
+100
0
5
+100
0
0.0
2000
50±0.2
5
05
0.
0.0
80±0.2
0.0
05
0.
*Please refer to page 7 the dimensional outline of sample stage.
φ18±0.2
0
433±2
φ12-0.05
262±1
85
Two split light guide VIS to NIR 2 m A10193-02
124±1
SIGNAL INPUT
15
C10028
9.7±0.5
PHOTONIC MULTI-CHANNEL ANALYZER
φ9.2
PHOTONIC MULTI-CHANNEL ANALYZER
231
115
57.5
C10027-02 (Extensibility model for research laboratory)
* The bending radius of the fiber is R150 mm or more.
13
Multipoint NanoGauge Thickness measurement system
C11295
Multipoint measurement model for real time simultaneous measurements
Multipoint
measurement
The Multipoint NanoGauge Thickness measurement system C11295 is a film
thickness measurement system utilizing spectral interferometry. It is
designed to measure film thickness as part of the semiconductor
manufacturing process, as well as for quality control of the APC and films
that are mounted on semiconductor manufacturing equipment. The C11295
performs real time multipoint measurements, and enabled simultaneous
measurements in multiple chambers and multipoint measurement on the
surface of a film. The C11295 can also measure the reflectance
(transmittance), the color of the object, and the temporal change
simultaneously with film thickness measurement.
20 nm
100 μm
Glass
Measurable
range
100 nm
1 μm
10 μm
100 μm
1 mm
Enables simultaneous measurements in multiple chambers in thin film
production lines and multipoint measurements in film production lines
Feature
1
Feature
2
Feature
3
Feature
4
Simultaneous film thickness measurement
up to 15 points
Reference-free operation
Stable long-term measurement by
correction of light intensity fluctuation
Alarm and warning function (pass/fail)
Feature
5
Feature
6
Feature
7
Feature
8
Feature
9
Feature
10
Specification
Type number
20 nm to 100 μm
Measurement reproducibility (glass) *3 *4
0.02 nm
Measurement accuracy *4 *5
±0.4 %
Light source *6
Xenon light source
Measurement wavelength range
320 nm to 1000 nm
Spot size *4
Working distance *4
Number of measurable layers
Analysis
Measurement time *7
External interface
Interface
Power supply voltage
Power consumption
Light guide connector shape
Measurement points
14
C11295-XX *1
Measurement film thickness range (glass) *2
Reflectance (transmittance) and spectrum measurements
High speed and high accuracy
Real time measurement
Precise measurement of fluctuating film
Analyze optical constants (n, k)
External control available
Spectral interferometry is used to measure film thickness.
When light enters a thin film sample, the sample produces a unique spectrum that
depends on the film thickness. Spectral interferometry is a technique for
measuring film thickness by analyzing that particular spectrum.
Reflected light
Incident light
Phase
difference
Intensity
Approx. φ1 mm
Intensity
Wavelength
10 mm
Max. 10 layers
FFT analysis, Fitting analysis
19 ms/point
Thin film
Wavelength
Film
Substrate
Number of signal interval increased.
Intensity
Wavelength
Thick film
Ethernet
USB 2.0 (Main unit - Computer) RS-232C (Light source - Computer)
AC 100 V to AC 240 V, 50 Hz/60 Hz
Approx. 330 VA (2 ch) to Approx. 450 VA (15 ch)
SMA
2 to 15
*1: -XX indicates the number of measurement points.
*2: When converted with the refractive index of glass = 1.5.
*3: Standard deviation (tolerance) when measuring 400 nm thick glass film.
*4: Depending on optical system or objective lens magnification to be used.
*5: Range of measurement guarantee as recorded in the VLSI Standards measurement guarantee document.
*6: The halogen light source model is C11295-XXH.
*7: Shortest exposure time
Multipoint measurement method
Concept view comparing multidetector and fiber branch method
Multipoint NanoGauge
Bifurcated fiber
Typical thickness measuring device
Light
Multidetector method source
Fiber branching method
Analyzer
Light source
Analyzer
Simultaneous measurement
Multibranching
fiber
Measurement time difference occurs
Measurement screen
Film thickness monitor
Color monitor
Measurement mode selection
film thickness / reflectance / transmittance
Monitor screen
Alarm and warning can be set
to appear during monitoring
Warning
screen
Measuring data
Measurement value trend data
Configuration example
Option
Data analyzer Laptop type C10471-21
C11295-03 standard system
Laptop type data analyzer is available as an option.
Standard
Option
Xenon Light source*
POWER
Data analyzer
Laptop type
C10471-21
Multipoint NanoGauge
Thickness measurement system
C11295
Film thickness measurement software
Sample
SMA Receptacle A12187-01
This receptacle is a tool for setting a fiber probe in a mount.
* Available using halogen light model.
Dimensional outline
(Unit: mm)
Light source light guide
308
(50.3)
20.3 30
4
500
+30
0
50
+50
0
1000
SMA connector
Xenon Light source (Approx. 6.4 kg)
φ8
φ4.8
* The bending radius of the fiber is R100 mm or more
12.7
30
Measurement light guide
SMA connector
1000
+100
0
100
10 000
+200
0
SMA connector
110
142
16
39.5
232
311
39.5
φ4.8
φ4.8
16
5
158
227
φ20
36
φ6
-0.02
φ15 -0.10
123.5
0
442
φ26 -0.1
Main unit (Approx. 6 kg)
* The bending radius of the fiber is R100 mm or more
15
Optical NanoGauge Thickness measurement system
Microscopic type for measuring thin film in small area
C10323
Microscope type
NanoGauge
The Optical NanoGauge Thickness measurement system C10323 is a
microscopic thickness measurement systems. Objects with irregular
surfaces that would produce high level of scattered light cannot be
measured at the macro level. For these types of objects, measuring a small
area reduces scattered light making measurement possible.
Feature
1
Feature
2
Feature
3
Feature
4
Thickness measurement in micro field of view
High speed and high accuracy
Analyze optical constants (n, k)
External control available
20 nm
50 μm
Glass
Measurable
range
100 nm
1 μm
10 μm
100 μm
1 mm
Highly accurate and real time measurement of thin film
in micro field of view through microscope
Specification
Type number
C10323-01
Measurement film thickness range (glass) *1
20 nm to 50 μm
Measurement reproducibility (glass) *2 *3
0.02 nm
Measurement accuracy *3 *4
Halogen light source
Measurement wavelength range
400 nm to 1100 nm
Working distance
Number of measurable layers
Analysis
External control function
External communication interface
Interface
Power supply voltage
Power consumption
When light enters a thin film sample, the sample produces a unique spectrum
that depends on the film thickness. Spectral interferometry is a technique for
measuring film thickness by analyzing that particular spectrum.
±0.4 %
Light source
Spot size *3
Spectral interferometry is used to measure film thickness.
Reflected light
Incident light
Phase
difference
Intensity
Intensity
φ8 μm to φ80 μm
Refer to objective lens list
Max. 10 layers
FFT analysis, Fitting analysis, Optical constant analysis
Thin film
Wavelength
Wavelength
Number of signal interval increased.
Film
Substrate
Intensity
Wavelength
Thick film
Yes (Option)
RS-232C, PIPE or Ethernet
USB 2.0
AC 100 V to AC 120 V/AC 200 V to AC 240 V, 50 Hz/60 Hz
Approx. 265 VA
*1: When converted with the refractive index of glass = 1.5.
*2: Standard deviation (tolerance) when measuring 400 nm thick glass film.
*3: Depending on optical system or objective lens magnification to be used.
*4: Range of measurement guarantee as recorded in the VLSI Standards measurement guarantee document.
Principle and advantages of microscopic system
Samples which are difficult to measure with the conventional macro
system, such as a wafer with irregular patterns and MEMS, can be
measured with a microscopic system. Samples with irregular
surfaces may not be able to be measured at the macro level due to
high level of scattered light. In the micro measurement with a
microscopic system, the measurement point can be narrowed down
to a flat area with little scattered light, that makes measurement
possible.
Microscopic
objective lens
Scattered Scattered
light
light
Scattered
light
Macro measurement
16
Micro measurement
with microscope
Configuration example
Option
Data analyzer Laptop type C10471-01
C10323-01 standard system
Standard
Option
Monitor
Laptop type data analyzer is available as an option.
PMA-12 Photonic multichannel
analyzer C10027-02
PMA-11
PHOTONIC MULTI-CHANNEL ANALYZER
SIGNAL INPUT
POWER
Data analyzer
Laptop type
C10471-01
Objective lens
5× to 50×
Microscopic
sample stage
A10407-01
Halogen lamp
L6758-11
Film thickness
measurement software
Objective lens
Lens
5×
Measurement spot size
φ80 μm
NA
0.14
Working distance
37.5 mm
10×
φ40 μm
0.26
30.5 mm
20×
φ20 μm
0.40
20.0 mm
50×
φ8 μm
0.42
17.0 mm
Microscopic sample stage A10407-01
(Stage moving area: 75 mm × 50 mm)
Microscopic sample stage for 6 inch wafer A10407-02
(Stage moving area: 150 mm × 150 mm)
(Unit: mm)
227
181
140.5
25.5
Microscopic sample stage for 6 inch wafer A10407-02
205
129
362±5
251±5
111
186
174
A10406
630±10
Optical NanoGauge
φ34
167±50 114±5
317
40
φ34
40±5
Microscopic sample stage A10407-01
84
134
262±5
(Approx. 15 kg)
134
Microscopic optics A10406-01
174
Dimensional outline
45
*Please refer to page 13 the dimensional outline of PMA-12 Photonic multichannel analyzer C10027-02 and halogen lamp L6758-11.
Related products　Micro optics A13097
Spot size can be narrowed down to cope with interface roughness,
scattering samples, and uneven film thickness
Specifications when C13027
Micro optics A13097-01
The A13097 is a micro-optical system for in-line film
thickness measurement, designed to measure samples that
are difficult or impossible to measure by a wide field of view.
When used in combination with an Optical NanoGauge
Thickness measurement system C13027 or C12562, the
spot diameter can be narrowed down to 100 μm in diameter
to allow measuring interface roughness as well as samples
with high scattering and very small areas on patterns, which
up until now have been difficult to measure. The A13097 is
quite stable even when there are variations in height, and so
gives reliable measurements at diverse manufacturing sites.
A sample stage type is also provided for off-line applications.
and A13097 are combined
Measurement film
thickness range (glass) *1
Measurement reproducibility (glass) *2 *3
Measurement accuracy *3 *4
0.1 μm to 100 μm
0.2 nm
±0.4%
Light source
Halogen light source
Measurement wavelength range
700 nm to 1100 nm
Spot size *3
Working distance *3
φ100 μm
32 mm
Height fluctuation
±2 mm
Maximum repetition frequency
200 Hz
Measurement time *4
Light guide connector shape
3 ms/point
FC
*1: When converted with the refractive index of glass = 1.5.
*2: Standard deviation (tolerance) when measuring 400 nm thick glass film.
*3: Depending on optical system or objective lens magnification to be used.
*4: With C13027
Micro optics A13097-11
17
Optical MicroGauge Thickness measurement system
C11011
High speed measurement model compatible with in-line systems,
capable of measuring up to 2.9 mm
Thick film measurement
with high speed
The Optical MicroGauge Thickness measurement system C11011 series is a
film thickness measurement system utilizing laser interferometry. High speed
measurement at 60 Hz, applicable to in-line measurement in production. In
addition, an optional mapping system can measure the thickness distribution
of a given specimen. The C11011 can be used in a wide range of
applications, such as product manufacture process monitoring or quality
control.
25 μm
10 μm
Measurable
range
1 μm
10 μm
2200 μm 2900 μm
Glass
900 μm 1200 μm
Silicon
100 μm
1 mm
High speed measurement of film, glass and wafer
Feature
1
Feature
2
Feature
3
Measurement of non-transparent (white color)
sample by infrared photometry
High speed measurement at 60 Hz
Measurement of pattern-formed wafer or
wafer with protective film
Feature
4
Feature
5
Feature
6
Long working distance
Mapping function
External control available
Specification
Type number
C11011-01
C11011-01W
Measurement film thickness range (glass) *1
25 μm to 2200 μm
25 μm to 2900 μm
Measurement film thickness range (silicon) *2
10 μm to 900 μm
Measurement reproducibility (silicon) *3
Measurement accuracy *3
Light source
10 μm to 1200 μm
< 500 μm: ±0.5 μm, ≥ 500 μm: ±0.1 %
Infrared LD (1300 nm)
φ60 μm
Working distance *4
155 mm
Number of measurable layers
Analysis
Wafer
1-layer (Multilayer measurement possible)
SiC coat, Si coat, Wet coat,
Polished Si, Optical disk
FPD
Peak detection
*5
External communication interface
Interface
Power supply voltage
Power consumption
16.7 ms/point
22.2 ms/point
Panel
RS-232C or PIPE
USB 2.0 (Main unit - Computer)
AC 100 V to AC 240 V, 50 Hz/60 Hz
Approx. 50 VA
*1: Glass refractive index equivalent.
*2: Silicon refractive index equivalent.
*3: Standard deviation when measuring Silicon
*4: Optional model with 1000 mm working distance is available. (Type number C11011-01WL)
*5: Shortest exposure time
18
Film
Optical film
100 nm
Spot size
Measurement time
Semiconductor
Wafer
Si for PV
panel
Cell gap, Glass thickness, DLC,
High-function film
AR coating, PET, Coating layer,
Coating film, Evaporation film, Functionality film
Acrylic resin, Video head
Configuration example
C11011-01, -01W standard system
Standard
Option
Optical fiber
Probe head
Standard
C11011-01, -01W mapping system for measuring thickness distribution
Wafer mapping software
Optical MicroGauge
Thickness measurement system
C11011-01, -01W
USB 2.0
Sample
Etcher or Grinder
Optical fiber
Wafer mapping software
Optical MicroGauge
Thickness measurement system
C11011-01, -01W
Probe head
Standard
USB 2.0
Data analyzer
C9025-02
RS-232C / PIPE
Standard
Option
Data analyzer
C9025-11
USB 2.0
Analysis method
Use laser interferometry to measure film thickness.
The probe head irradiates sample with near infrared light which reflects back
from the film front surface. Some of the light transmits through the film and
reflects back from the boundary on the opposite side. The controller internally
processes each reflected light to detect the position where light was reflected
or in other words the position on the film boundary. The controller then
calculates the film thickness from the distance between the detected peaks.
In-situ monitoring of thickness (during wet etching)
Measurement data
Thickness measurement data
Thickness (μm)
Principle
Mapping stage
C8126-21,-22
400
300
200
100
0
OPTICAL MICRO GAUGE C11011
Measurement of bonded wafer
(multilayer)
Power
Probe head
Incident light
Reflected
light from the
boundary
Distance
between the
peaks
indicates film
thickness
Film
Substrate
0
100 200 300 400 500
Time (second)
Thickness distribution
of a wafer
Display from 70 μm to 76 μm
Sample: 8-inch Si bare wafer
(Protective film / after grinding process)
Option
Mapping stage φ200 mm C8126-21
Mapping stage φ300 mm C8126-22
Probe head Acid resistance A8653-02
Measurement time: 1 s/point
Measurement area: to 140 mm square (C8126-21)
(4 inch wafer to 8 inch wafer)
: to 200 mm square (C8126-22)
(4 inch wafer to 12 inch wafer)
Stage movement resolution: 0.1 mm
Stage movement repeatability: ±0.01 mm
This probe head is surface-treated to make it
acid-resistant and is recommended for use while
mounted in wet etching equipment.
Horizontal setting optics A9925-01
This optical system is designed to connect to
the probe head and is useful when installing the
probe head in narrow locations with little working
distance.
Data analyzer C9025-01
Desktop type data analyzer for the standard system
Data analyzer C9025-02
Data analyzer for Mapping system C9025-11
Laptop type data analyzer for the standard system
Desktop type data analyzer for the wafer mapping system
Data analyzer for Mapping system C9025-12
Laptop type data analyzer for the wafer mapping system
Dimensional outline
(Unit: mm)
Probe head Standard A8653-01
Main unit (Approx. 8.5 kg)
WD=155±0.2
13.9
95.8±0.2
φ34±0.5
383±1
φ15±0.3
412±1
φ19±0.3
POWER
5.9±1
123.5±1
OPTICAL MICRO GAUGE C11011
Optical fiber (4 m)
* The bending radius of the fiber is R30 mm or more.
19
Option
Mapping stage
C8126 series
Mapping thickness distribution of wafer and thin film
Compatible with Optical NanoGauge or Optical MicroGauge
The Mapping Stage C8126 series is a
mapping system that performs wafer
and film in-plane thickness distribution
measurement when combined with any
one of the various Optical Gauge
series. The C8126 can be used for
examination of in-plane uniformity of
etching and grinding property and for
quality control purpose.
Feature
Type number
Mapping stage φ200 mm
C8126-21
Mapping stage φ300 mm
C8126-22
Mapping stage φ200 mm
C8126-31
Mapping stage φ300 mm
C8126-32
Measurable range
Wafer (inch)
1
Compatible with
NanoGauge / MicroGauge
Film (mm)
Feature
2
4 to 8
< 140 × 140
4 to 12
< 200 × 200
4 to 8
< 140 × 140
4 to 12
< 200 × 200
C11011-01
C11011-01W
Feature
3
C13027-11
Thickness distribution measurement
Mapping thickness distribution of patternformed wafer
Mapping thickness distribution of patternformed wafer with protective film
*For more details of the specification, please contact us.
C8126-21, -22 (For C11011 series)
Standard
Option
Probe head
Standard
A8653-01
C8126-31, -32 (C13027-11 supported)
Data analyzer Laptop type
C10471-21
Optical MicroGauge Thickness measurement system
C11011-01, -01W
USB 2.0
Wafer mapping
software
Power
Optical fiber
Wafer
mapping
software
RS-232C/Ethernet
Wafer
Stage unit
Interface
(USB 2.0)
Data analyzer
C9025-11
Stage unit
Standard
Option
Optical NanoGauge Thickness
measurement system
C13027-11
Specification
Type number
C8126-21, -31
Stage movement resolution
C8126-22, -32
0.1 mm
Stage movement repeatability
±0.01 mm
Power requirement *1
AC100 V to AC117 V, AC200 V to AC240 V , 50 Hz/60 Hz
Power consumption
120 VA (at 100 V), 160 VA (at 200 V)
820 mm(W) × 550 mm(H) × 600 mm(D) Approx. 67 kg
940 mm(W) × 595 mm(H) × 750 mm(D) Approx. 82 kg
Dimensional outline / Weight
*For more details of the specification, please contact us. *1: Either 100 V system or 200 V system can be selected.
★ Product and software package names noted in this documentation are trademarks or registered trademarks of their respective manufacturers.
● Subject to local technical requirements and regulations, availability of products included in this promotional material may vary. Please consult your local sales representative.
● Information furnished by HAMAMATSU is believed to be reliable. However, no responsibility is assumed for possible inaccuracies or omissions. Specifications and external
appearance are subject to change without notice.
© 2016 Hamamatsu Photonics K.K.
HAMAMATSU PHOTONICS K.K.
www.hamamatsu.com
HAMAMATSU PHOTONICS K.K., Systems Division
812 Joko-cho, Higashi-ku, Hamamatsu City, 431-3196, Japan, Telephone: (81)53-431-0124, Fax: (81)53-435-1574, E-mail: [email protected]
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Cat. No. SSMS0043E08
APR/2016 AK
Created in Japan