FUJITSU CS200A

65nm CMOS Technology, CS200 / CS200A
Description
As miniaturization of silicon devices progresses,
Fujitsu provides the most competitive, world-class
technology to ASIC and COT customers. Fujitsu's
65nm technology has shrunk gates by 25% when
compared to the 90nm technology.
Fujitsu will start tape-out acceptance for the
technology in early 2006.
Features
• The 30nm long gate, only 75% the size of the
CS100 transistors.
• 20 to 30% faster performance than the 90nm
generation.
• Transistor density doubled compared with the
90nm generation.
• SRAM cell area reduced 50% compared with the
90nm generation.
Specifications
Gate length
Core VDD
Gate oxide thickness (physical)
Gate electrode
Source / drain electrode
Interconnects
Metal 1 pitch
Inter-level dielectric
Drain current enhancement
65nm (CS200)
65nm (CS200A)
30nm
1.0V
1.1nm
NiSi / Poly-Si
NiSi
11-Cu + 1-Al
0.18µm
Porous ULK (k = 2.25)
Advanced stress control
50nm
1.2V
1.7nm
CoSi2 / Poly-Si
CoSi2
s
s
s
s
65nm CMOS Technology, CS200 / CS200A
Technology Lineup
Leakage current
Large
CS200A: Wide Speed Range + Low Power Consumption
Low Power
Lineup
CS200A
HS-Tr
HV-Tr
Mobile
Computing
STD-Tr
Digital Consumer
High End Server
Core
High
Performance
Lineup CS200
LL-Tr
Cellular Phone
UHS:Ultra high speed, HS:High speed
STD:Standard, LL:Low leakage
Speed
Fast
Fujitsu provides two series of technology: CS200 for
high-end use such as high-performance server CPU
chips, and CS200A for low-power or mobile use.
The CS200A technology, in particular, provides a
great variety of transistors from low-leakage (LL)
for cellular phones to ultra-high-speed (UHS) for
servers or network devices. Customer can mix the
transistors in a chip to meet their needs.
The 65nm family consists of the low-power
CS200A and the high-performance CS200, giving
customers the flexibility to choose the appropriate
technology to differentiate their products. The HVt
(high Vth transistor) of the CS200 achieves higher
Technology families
CS200A
CS200
Standard
HS-Tr
Server/
Network
STD-Tr
UHS-Tr
I/O
SRAM
Vdd
UHS
HS
STD
LL
HVt
1.8V
2.5V
3.3V
3.3V LVt
6T Symmetry
1.2V
x
x
x
x
x
x
x
x
0.535µm2
1.0V
x
x
x
x
x
0.595µm2
performance. The I/O ranges from 1.8V to 3.3V. For
the CS200A, 1.8 (2.5 or 3.3V) I/O-transistors can be
embedded in a chip. The SRAM memory cell size is
less than 0.6µm2.
SPICE simulations for some benchmarking circuits
show that the new product is 20 to 30% faster than
the previous version. The great performance
improvement is a result of Fujitsu's advanced technology, which was developed for the company's
high-performance servers. The chip size of the
CS200 is only 60% the size of CS100, when making
the same spec LSI, which is 4M gate logic and 2M
gate macro. (SRAM: 0.5Mbit, PLL, etc.)
CS200 Circuit Delay Performance (ps per gate)
CS200
CS100
Inverter
5.7
7.0
2-input NAND
8.7
11.4
2-input NAND + 200-grid interconnect load
23.1
30.8
Delay reduction
77%
69%
67%
IP Portfolio
Fujitsu's foundry services offer an extensive IP
lineup, including CPU cores, image cores,
encryption, interface controllers and high-speed I/O,
all prepared for 65nm ASIC.
assembly and testing. Packaging options include
standard BGA and Flip-Chip BGA (FC-BGA).
Fujitsu is the acknowledged global leader in
advanced packaging technology, innovation, patents
and manufacturing techniques.
Fujitsu provides a one-stop, turnkey packaging
service, which includes package design, simulation,
FUJITSU MICROELECTRONICS AMERICA, INC.
Corporate Headquarters
1250 E. Arques Ave. Sunnyvale, CA 94088-3470
Tel: (800) 866-8608 Fax: (408) 737-5999
E-mail: [email protected] Web Site: http://us.fujitsu.com/micro
©2005 Fujitsu Microelectronics America, Inc.
All company and product names are trademarks or
registered trademarks of their respective owners.
Printed in the U.S.A. WFS-FS-21139-9/2005