BITECH 36KR10KLF

Model 36
6 MM SINGLE-TURN
Open Frame
Cermet Trimming
Potentiometer
RoHS Compliant
STYLES AVAILABLE
Top Adjust
36F
Side Adjust
36K
Side Adjust
36W
Top Adjust (2.5 mm pin spacing)
36P
ELECTRICAL1
Resistance Range
100 to 1,000,000 Ohms
Standard Resistance Tolerance
± 20%
Input Voltage, Maximum
100 V
Power rating, Watts
0.3 @ 70°C
End Resistance, Maximum
<500 ohms: 10 Ohms Max; > 500 ohms: 2% Max.
Actual Electrical Travel
215° ±5°
Mechanical Travel
240° ±20°
Insulation Resistance, Minimum
100 Megohms
Resolution
Essentially infinite
Contact Resistance Variation
5% Max.
Temperature Coefficient of Resistance
±250 ppm/°C
MECHANICAL
Torque, Maximum
2.1 in. oz.
Weight, Approx.
0.01 oz.
Wiper Position
1
Approx. 50%
Specifications subject to change without notice.
BI Technologies Corporation
4200 Bonita Place, Fullerton, CA 92835 USA
Phone: 714 447 2345
November 27, 2006
Website: www.bitechnologies.com
page 1 of 3
BI technologies
Model 36
ENVIRONMENTAL
Operating Temperature Range
-30°C to +100°C
Rotational Life, 50 Cycles
±10% ∆R
Load Life, 0.3W, 500 Hours, 70°C
±5% ∆R
Resistance to Solder Heat
260°C for 3 sec.
Aqueous cleaning not recommended
ORDERING INFORMATION2
36 W R10K LF
Model Series
Style F, K, W, P
RoHS Compliant Product Code
Std. Package 500 pc/bag
Resistance Value (see tables below)
CIRCUIT DIAGRAM
STANDARD RESISTANCE
RESISTANCE VALUES AND MARKING
MARKING
2
Resistance
(ohms)
Part
Marking
100
12
200
22
500
52
1K
13
2K
23
5K
53
10K
14
20K
24
50K
54
100K
15
200K
25
500K
55
1MEG
16
Contact our customer service for custom designs and features.
BI Technologies Corporation
4200 Bonita Place, Fullerton, CA 92835 USA
Phone: 714 447 2345
November 27, 2006
Website: www.bitechnologies.com
page 2 of 3
BI technologies
Model 36
OUTLINE DRAWING3
Model 36F (Top Adjust)
Model 36K (Side Adjust)
Model 36W (Side Adjust)
Model 36P (Top Adjust)
3
Dimensions are in millimeters.
BI Technologies Corporation
4200 Bonita Place, Fullerton, CA 92835 USA
Phone: 714 447 2345
November 27, 2006
Website: www.bitechnologies.com
page 3 of 3
BI technologies