MOSFET Transient Junction Temperature Under Repetitive UIS/Short-Circuit Conditions

AND9042/D
MOSFET Transient Junction
Temperature Under
Repetitive UIS/Short-Circuit
Conditions
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APPLICATION NOTE
INTRODUCTION
real significance in actual applications. Knowing the peak
transient junction temperature will help in predicting the
MOSFET survival time in fault conditions.
Power MOSFET is a popular choice of switching device
in a wide range of electronics. Majority of their applications
is to control and regulate the high power section of a system.
With technology advancements and cost competitiveness
requirements, power MOSFETs are on die-shrinking trend.
Smaller and cheaper MOSFETs are replacing the old bulky
with additional improvements in efficiency and noise. For
the same on-resistance, trench technology requires less than
half the size of a planar counter part. For most markets, the
improvements in efficiency and cost allow smaller packages
and better profit margins. For some, the reduction in die size
poses a potential hazardous problem in their systems.
Several hazardous examples are discussed and methods to
evaluate them are explained in details.
Thermal performance is an important parameter in most
MOSFET applications such as dc/dc converters,
uninterruptible power supplies (UPS), and motor control. In
UPS or motor applications, MOSFETs are required to
handle sudden surges of high current under fault conditions.
Without a method of measuring the transient junction
temperature of power devices, engineers are left to speculate
about thermal failures. Junction temperature (Figure 1) is
internal to the power device. Thermal measurements using
thermocouples or IR cameras can only measure the average
case temperature. Knowing the power applied to the power
devices will allow peak junction temperature to be derived.
The peak MOSFET junction temperature will determine the
failure point. MOSFET datasheets’ maximum values are
derated for rated temperature range and do not represent any
TEMPERATURE RISE
Case
Junction
Junction
Case
1E−06
0.0001
0.01
1
100
1000
TIME
Figure 1. Junction and Case Temperature Transient
for a Typical TO−220
Most repetitive avalanche energy ratings (EAR) are based
on infinite heat sink model (fixed case temperature). In real
applications, repetitive high power events contribute to
a significant increase in average power dissipation and raise
the case temperature. Also, the values are derived using
rated temperature with the assumption of a rectangular
power pulse. Under repetitive avalanche situations, the
power pulses are triangular with respect to time.
PROCEDURES
A simplified method uses the existing MOSFET
datasheet’s thermal impedance graph
1. Using a single event (single UIS, single short
circuit cycle) transient temperature
2. Average temperature rise model
3. Superimpose both to have the overall transient
behavior
There are several ways to create the transient temperature
rise curves under high power dissipation conditions.
1. Spice modeling with the Cauer/Foster model
including the heat sink/PCB
2. Spreadsheet modeling thermal networks
Both methods require tools/software and information,
which are not always available, and significant processing
time to extend to the steady state.
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The profile of a high power single event needs to be
known to calculate the junction temperature rise. For
unclamped inductive switching (UIS), the power pulse will
have the shape of a right triangle.
The peak temperature rise for different power pulse
shapes will differ. Using the method described by R. Stout
[1], the transient temperature rise for a single event can be
evaluated.
Single event power loss =
Normal operation power loss =
Average transient temperature = RthjA(t) * (Psingle + Pd−avg)
Overall transient = average transient + single event
Psingle
Pd−avg
EXAMPLE: MOTOR DRILL REPETITIVE UIS CONDITIONS
24 V battery, 5 mH parasitic inductance, 5 kHz frequency,
10% duty cycle, 60 V TO−220 MOSFET NTP5863N.
Power uis + 32 mJ * 5000 Hz + 160 W
Power normal + 10 W (assumed)
†60 V MOSFETs’ have ~10% higher breakdown than rated and 30%
increase due to avalanche heating.
CURRENT (A) VOLTAGE (V)
Voltage
Figure 2. Motor Drill Under UIS Fault
In single MOSFET trigger applications, such as the drill
flyback circuit (Figure 2), repetitive UIS can occur. In this
case, the MOSFET can be overstressed when the drill jams.
The number of cycles or time the drill will survive in this
situation is critical. When the drill is jammed, the current
ramps up with parasitic inductance in the on-time. This
stores energy in the parasitic inductor and can cause the
MOSFET to avalanche during the off-time. The avalanche
breakdown voltage (VBD) will increase by 30% from its
rated voltage due to heating of the device. Finally, the drain
voltage of the MOSFET will settle to battery voltage
(VBattery) before another cycle begins. The avalanche time
(tAV) is the duration required for Ipeak to reduce to zero
during the off-time.
I peak +
ǒFSW * LǓ
+
24 * 0.1
5000 * 5 * 10 −6
7000
VBD
6000
80
5000
60
Current
Voltage
4000
40
3000
Vbattery
2000
20
1000
0.E+00
Power
0
2.E−05
TIME (s)
4.E−05
Figure 3. UIS Waveform
Single UIS Temperature Transient (Figure 4)
Refer to the MOSFET’s thermal response graph
(Figure 5) and fit a line equation at the fast transient (up to
atleast tAV). It follows a sqrt(t) relationship [2]. The die
thickness determines the period of fast transient sqrt(t)
relationship is valid [3] (~500 ms for TO−220 package).
Fitted Fast R thjA + K * Ǹt + 13 * Ǹt
+ 96 A
ƪ°WCƫ
(Figure 5)
This fitted fast transient RthjA will help in creating a single
UIS temperature transient. The power pulse of a single UIS
event is transformed into 10 even discrete power pulses for
the following equation and its detail derivation in
Appendix I.
V BD +Y 1.3 * 60 V * 1.1 + 86 V †
t AV + L * I peakńǒV BD * V BatteryǓ + 7.74 ms
Energy Dissipated +
8000
100
0
Repetitive UIS Power Derivations (Figure 3)
V Battery * D
9000
120
POWER (W)
24V
+
Current
Temperature Rise + R thj(t) * Power(t)
1
* V BD * I peak * t AV
2
Po + Peak Power + 86 V * 96 A + 8256 W
V BD
1
+ * L * I peak 2 *
2
V BD * V Battery
+ 32 mJ
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T rise@n
t av
+
10
Po * K
10
Average Temperature Transient
*
+
Po * K
10
*
+ R thjA(t) * ǒPower UIS ) Power d−avgǓ
Ǹt10 * ƪ10 * Ǹn * S1n Ǹnƫ,
+ R thjA(t) * 170 W
n v 10
AV
Ǹt10 * ƪ10 * Ǹn * n S*n 9 Ǹnƫ,
Peak Single UIS Temperature + maxǒT risein t AVǓ
+ 131° C
n u 10
AV
Peak Junction Temperature Transient (Figure 6)
+ 131° C ) R thjA(t) * 170 W
Utilizing the above formula and plotting the transients, the
peak temperature occurred at n = 5.
T rise@
t AV
2
+
8256 * 13
*
10
The peak temperature equation above ignored the
transient between high power events. For most cases, it
should be a good approximation. But for a much lower
frequency where time between high power events are long,
temperature transient between them might be needed.
Ǹ7.74E−6
*
10
* ƪ10 * Ǹ5 * Ǹ1 * Ǹ2 * Ǹ3 * Ǹ4 * Ǹ5ƫ + 131° C
Single UIS Event Temperature Transient
140
8000
120
POWER (W)
7000
6000
100
5000
80
4000
60
3000
40
2000
20
1000
0
0.0E+00
5.0E−06
1.0E−05
TIME (s)
1.5E−05
T rise@(10 ) 10m)s + R thjA(10s) * 170 W )
TEMPERATURE RISE (°C)
9000
Example Junction Temperature at 10 s + 10 ms
*
+ 281.9° C
10 ms is approximate n = 13 (10 ms / (7.74 ms / 10) =~13)
The temperature calculations above are referring to the
rise in temperature. Adding the ambient temperature will
obtain the actual junction temperature.
Figure 4. UIS Transient Temperature Rise
Temperature Transients
TEMPERATURE RISE (°C)
700
Overall Repetitive UIS Temperature Transient
The thermal impedance with a heatsink (Figure 5),
RthjA(t), included can be obtained. The heat capacity of the
material,CHS, and thermal resistance, RHS, provided by the
heatsink vendor forms a RHS CHS network to the RthjC(t) [4].
ǒ
ƪ10 * Ǹ13 * Ǹ4 * Ǹ5 * Ǹ6 * Ǹ7 * Ǹ8 * Ǹ9
Ǹ7.74E−6
10
* Ǹ10 * Ǹ11 * Ǹ12 * Ǹ13] + 1.25 * 170 ) 69.4
0
2.0E−05
R thjA(t) + R thjC(t) ) R HS * 1 * e −tńǒR HS*C HSǓ
8256 * 13
10
Ǔ
NTP5863N Thermal Impedance
600
500
400
300
200
Single UIS
100
0
1.E−07
10
RthjA = Single Pulse + Heatsink
Average Power
Temperature Transient
1.E−05
1.E−03 1.E−01
1.E+01
1.E+03
TIME (s)
Figure 6. Overall Transient Temperature rise
1
R(t) (°C/W)
RthjC = Single Pulse
0.1
0.01
Fitted Fast Transient line
13 * √t
0.001
0.000001 0.0001
0.01
1
PULSE TIME (s)
100
10k
Figure 5. Thermal Impedance of NTP5863N
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INTRINSIC TEMPERATURE
The silicon MOSFET junction temperature is limited by
its intrinsic temperature. It was shown that localized hot spot
(mesoplasma) occurs at intrinsic temperature [5].
With a theoretical intrinsic temperature of 370°C,
NTP5863 will fail in around 10 seconds (Trise = 345°C)
under the previously specified repetitive UIS condition. If
the peak temperature never reaches intrinsic temperature
under steady state, the device will survive the repetitive
avalanches assuming failure mode is thermal.
SURFACE-MOUNT DEVICES
NTMFS5832NL Single Pulse Thermal Impedance
Surface-mount device datasheet provides thermal
impedance (RthjA) graph of a specific copper area, thickness
and PCB material. RthjA will change significantly with
different PCB conditions. ON Semiconductor does provide
different RthjA graphs for different copper area and thickness
upon request; even so, these curves may not take into
account all significant variables of the actual customer
application [6].
100
R(t) (°C/W)
10
Single Pulse
1
0.1
Fitted Fast Transient line
17 * √t
0.01
0.000001
0.0001
0.01
1
100
PULSE TIME (s)
Figure 7. NTMF5832NL Surface Mount SO8FL
Package with 1 in2 Pad [2 oz] Copper Area
REPETITIVE SHORT-CIRCUIT
time divisions for deriving its discrete temperature transient
formula below.
In all UPS short circuit testing at the output is
a requirement. With the output shorted (secondary side of
transformer), the primary side H-bridge/Push-Pull
MOSFETs turn on with little impedance passing huge
current repetitively. This will incur tremendous power loss
in a short period of time until the microcontroller shuts
down. Low on-resistance devices are commonly used so
power loss will be dominated by the switching losses.
T rise(rectangular)
+
P o * K * Ǹt
P o * K * ƪǸt * Ǹt * t SCƫ
T rise(iso. triangle)@n
Single Short-circuit Temperature Transient
The procedure for getting the peak temperature transient
under short-circuit conditions is similar to the previous
repetitive UIS example. Except that the power pulse for
short-circuit, tSC, will be different. Therefore, the previous
Trise equation (for right angle power pulse) will not apply.
The exact power pulse depends on circuit implementations
like MOSFETs’ saturation current and parasitic
inductances.
Fitted Fast R thjA + K * Ǹt + 17 * Ǹt
Po * K
10
Po * K
+
10
*
*
t v t SC
t u t SC
t SC
20
Ǹt20 * S1n Ǹn ,
n v 10
SC
n
n−10
Ǹt20 * ƪn−9
S Ǹn * S Ǹn * 10ƫ
SC
1
10 t n v 20
[7]
Po * K
10
An example of temperature rise for an isosceles triangle
and rectangle power pulse is shown (Figure 8). The
isosceles triangle was divided into 10 equal powers and 20
*
n
n−10
Ǹt20 * ƪn−9
S Ǹn * S Ǹn * 10ƫ
SC
n−19
n u 20
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POEWR (W)
3000
Rectangular
Pulse
2000
14
12
10
1500
8
1000
6
4
500
Triangular
Pulse
0
0.E+00
0.E−0.7
1. Rectangle Short-circuit Power Pulse
TEMPERATURE RISE (°C)
18
3500
2
Peak Single Short-circuit Temperaturerect = 17°C
power rect + 3200 W * 100 ns * 300 kHz ) 2 W + 98 W
R thjA +
370° C * 17° C * 25° C
98 W
+ 3.35
°C
W
Device reaches 3.4°C/W and failure temperature in 0.1sec
with specified rectangular power pulse.
0
2.E−07
2. Triangle Short-circuit Power Pulse
Peak Single Short-circuit Temperaturetri = 9°C
TIME (s)
Figure 8. Transient Temperature for Different Power
Pulse Shapes
Power tri +
R thjA +
Example: Buck Converter Shoot-thru
Buck converter, 300 kHz frequency, 100 ns short-circuit
with rectangular or triangular power pulse, 40 V SO−8 FL
MOSFET NTP5863N, 2 W Pd−avg, Ambient = 25°C,
assumed failure junction temperature of 370°C
1
* 3200 W * 100 ns * 300 kHz ) 2 W + 50 W
2
370° C * 9° C * 25° C
50 W
+ 6.7
°C
W
Device reaches 6.7°C/W and failure temperature in 0.5 s
with specified triangular power pulse.
OTHER IMPLICATIONS
Mounting conditions have a huge influence on the thermal
resistance [7]. When thermal pads or grease are used, their
thermal resistance should be included. Due to their
negligible heat capacity compared to the heatsink,
additional RC thermal network is not needed but simply
adding the resistance to RHS.
The intrinsic temperature varies with MOSFET
technologies. For different breakdown voltage MOSFETs,
they will have different doping concentrations. A higher
breakdown voltage usually has lower silicon doping than
lower breakdown. A higher doping concentration results in
a higher intrinsic temperature.
CONCLUSION
will have a smaller peak junction temperature in the fast
transient and a smaller steady state temperature rise for the
same power pulse.
Although a lower thermal impedance indicates a better
thermal capability, the breakdown voltage variations
between different devices affect the UIS pulse time and
energy. Also a larger die will have larger input capacitances
resulting in higher switching power loss. Therefore,
calculation of power losses and deriving the transient
junction temperature will be a better determining factor in
MOSFET selection.
This method is also applicable to other power devices
through knowing the power pulse transient and average
power applied.
The K term used in the fast transient also reveals the
relative die size in the same MOSFET package family.
K+
2
A Ǹòpkc
[2]
where:
A = Area
r = Density
K = Thermal Conductivity
c = Thermal Capacity of Silicon
It is obvious that the fast transient (<~1 ms) depends on
the die size, slow transient (~1 ms to 1 s) depends on the
package type, and steady state transient depends on the
mounting conditions. If it is in the same package, a larger die
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REFERENCES
[1] “How to Generate Square Wave, Constant Duty
Cycle, Transient Response Curves”,
http://www.onsemi.com/pub_link/Collateral/AND821
9−D.PDF
[2] D.L. Blackburn, “Power MOSFET Failure
Revisited”, Proc. 1988 IEEE Power Electronics
Specialists Conference, pp 681−688, April 1988
[3] “Semiconductor Package Thermal Characterization“,
http://www.onsemi.com/pub_link/Collateral/AND821
5−D.PDF
[4] “Thermal RC Ladder Networks”,
http://www.onsemi.com/pub_link/Collateral/AND822
1−D.PDF
[5] A. C. English, “Physical Investigation of the
Mesoplasma in Silicon”, IEEE Trans. Elec. Dev.
Vol−13(8/9), pp. 662−667, Aug 1966
[6] “Predicting the Effect of Circuit Boards
ON Semiconductor Package Thermal Performance”,
http://www.onsemi.com/pub_link/Collateral/AND822
2−D.PDF
[7] “Mounting Considerations For Power
Semiconductors”,
http://www.onsemi.com/pub_link/Collateral/AN1040
−D.PDF
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APPENDIX I. THERMAL RESPONSE TRANSFORMATION
Temperature Rise + Power * Rth
Rth + K * Ǹt
PO
0
TAV
t1
t2
t3
t4
t5
t6
Power
t7
Temperature
t8
t9
Figure 9. Right Angle Triangle Power Pulse Decomposed and Constructed From Superposition to Form Thermal
and Power Response
Approximate temperature rise at each time intervals,
t 1 : P o * K * Ǹt 1 *
Po
10
* K * Ǹt 1
t 2 : P o * K * Ǹt 2 *
ǒP10 * K * Ǹt Ǔ * ǒP10 * K * Ǹt
2 * t1
t 3 : P o * K * Ǹt 3 *
ǒP10 * K * Ǹt Ǔ * ǒP10 * K * Ǹt
3 * t1
o
o
2
o
o
3
…
t 10 : P o * K * Ǹt 10 *
o
o
10
ǒP10 * K * Ǹt
10 * t 4
*
ǒP10 * K * Ǹt
10 * t 9
o
Ǔ * ǒP10 * K * Ǹt
ǒP10 * K * Ǹt Ǔ * ǒP10 * K * Ǹt
*
o
Ǔ
Ǔ * ǒP10 * K * Ǹt
o
o
Ǔ * ǒP10 * K * Ǹt
o
10 * t 1
Ǔ * ǒP10 * K * Ǹt
10 * t 5
Ǔ
3 * t2
o
…
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o
Ǔ * ǒP10 * K * Ǹt
10 * t 6
Ǔ
Ǔ * ǒP10 * K * Ǹt
10 * t 2
o
Ǔ
10 * t 3
Ǔ * ǒP10 * K * Ǹt
10 * t 7
o
10 * t 8
Ǔ
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t 21 : P o * K * Ǹt 21 *
ǒP10 * K * Ǹt Ǔ * ǒP10 * K * Ǹt
o
o
21
*
ǒP10 * K * Ǹt
21 * t 4
*
ǒP10 * K * Ǹt
21 * t 9
o
o
Ǔ * ǒP10 * K * Ǹt
o
Ǔ * ǒP10 * K * Ǹt
o
21 * t 1
Ǔ * ǒP10 * K * Ǹt
o
21 * t 5
Ǔ * ǒP10 * K * Ǹt
21 * t 2
o
Ǔ * ǒP10 * K * Ǹt
o
21 * t 6
Ǔ
21 * t 3
Ǔ * ǒP10 * K * Ǹt
21 * t 7
o
21 * t 8
Ǔ
Ǔ
For 10 division of right angle triangle power pulse,
t1 +
t AV
10
, t 10 * t 4 + 6 *
t AV
Po * K
T rise @ n
t AV
10
10
10
t AV
10
AAA
Ǹn *10t * Sn1 ǒP 10* K Ǹn *10t
AV
+
Po * K
, t 21 * t 7 + 14 *
*
o
Ǔ
AV
³
Po * K
10
*
Ǹt10 * ǒ10 * Ǹn * S1n ǸnǓ,
AV
n
Ǹt10 * ƪ10 * Ǹn * n−9
S Ǹnƫ,
AV
n v 10
n u 10
For higher resolutions, 30 divisions formula will be:
Po * K
T rise @ n
t AV
30
30
*
+
Po * K
30
*
Ǹt30 * ƪ30 * Ǹn * Sn1 Ǹnƫ,
AV
n v 30
n
Ǹt30 * ƪ30 * Ǹn * n−29
S Ǹnƫ,
AV
n u 30
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