CENTRAL CP611

PROCESS
CP611
Central
Power Transistor
TM
Semiconductor Corp.
PNP - Amp/Switch Transistor Chip
PROCESS DETAILS
Process
EPITAXIAL BASE
Die Size
80 X 99 MILS
Die Thickness
12.5 ± 1 MILS
Base Bonding Pad Area
12 X 32 MILS
Emitter Bonding Pad Area
13 X 46 MILS
Top Side Metalization
Al - 50,000Å
Back Side Metalization
Cr/Ni/Ag - 16,000Å
GEOMETRY
GROSS DIE PER 4 INCH WAFER
1,450
PRINCIPAL DEVICE TYPES
CJD42C
TIP42C
BACKSIDE COLLECTOR
145 Adams Avenue
Hauppauge, NY 11788 USA
Tel: (631) 435-1110
Fax: (631) 435-1824
www.centralsemi.com
R3 (21-September 2003)
Central
TM
Semiconductor Corp.
145 Adams Avenue
Hauppauge, NY 11788 USA
Tel: (631) 435-1110
Fax: (631) 435-1824
www.centralsemi.com
PROCESS
CP611
Typical Electrical Characteristics
R3 (21-September 2003)