Aerospace Electronics 32K x 8 STATIC RAM—SOI HX6356 FEATURES RADIATION OTHER • Fabricated with RICMOS™ IV Silicon on Insulator (SOI) 0.75 µm Process (Leff = 0.6 µm) • Listed On SMD# 5962-95845 • Total Dose Hardness through 1x106 rad(SiO2) • Fast Read/Write Cycle Times ≤ 17 ns (Typical) ≤ 25 ns (-55 to 125°C) • Neutron Hardness through 1x1014 cm-2 • Typical Operating power < 15 mW/MHz • Dynamic and Static Transient Upset Hardness through 1x1011 rad(Si)/s • Asynchronous Operation • Dose Rate Survivability through 1x1012 rad(Si)/s • CMOS or TTL Compatible I/O • Soft Error Rate of <1x10-10 upsets/bit-day in Geosynchronous Orbit • Single 5 V ± 10% Power Supply • Latchup Free GENERAL DESCRIPTION The 32K x 8 Radiation Hardened Static RAM is a high performance 32,768 word x 8-bit static random access memory with industry-standard functionality. It is fabricated with Honeywell’s radiation hardened technology, and is designed for use in systems operating in harsh, transient radiation environments. The RAM operates over the full military temperature range and requires only a single 5 V ± 10% power supply. The RAM is available with either TTL or CMOS compatible I/O. Power consumption is typically less than 15 mW/MHz in operation, and less than 5 mW when de-selected. The RAM read operation is fully asynchronous, with an associated typical access time of 14 ns at 5V. Honeywell’s enhanced SOI RICMOS™ IV (Radiation Insensitive CMOS) technology is radiation hardened through the use of advanced and proprietary design, layout and process hardening techniques. The RICMOS™ IV process is a 5-volt, SIMOX CMOS technology with a 150 Å gate oxide and a minimum drawn feature size of 0.75 µm (0.6 µm effective gate length—Leff). Additional features include tungsten via plugs, Honeywell’s proprietary SHARP planarization process, and a lightly doped drain (LDD) structure for improved short channel reliability. A 7 transistor (7T) memory cell is used for superior single event upset hardening, while three layer metal power bussing and the low collection volume SIMOX substrate provide improved dose rate hardening. • Packaging Options - 36-Lead CFP—Bottom Braze (0.630 in. x 0.650 in.) - 36-Lead CFP—Top Braze (0.630 in. x 0.650 in.) HX6356 FUNCTIONAL DIAGRAM A:0-8,12-13 32,768 x 8 Memory Array • • • Row Decoder 11 CE NCS • • • 8 Column Decoder Data Input/Output NWE 8 DQ:0-7 WE • CS • CE NOE NWE • CS • CE • OE (0 = high Z) A:9-11, 14 Signal 1 = enabled # Signal All controls must be enabled for a signal to pass. (#: number of buffers, default = 1) 4 SIGNAL DEFINITIONS A: 0-14 Address input pins which select a particular eight-bit word within the memory array. DQ: 0-7 Bidirectional data pins which serve as data outputs during a read operation and as data inputs during a write operation. NCS Negative chip select, when at a low level allows normal read or write operation. When at a high level NCS forces the SRAM to a precharge condition, holds the data output drivers in a high impedance state and disables all input buffers except CE. If this signal is not used it must be connected to VSS. NWE Negative write enable, when at a low level activates a write operation and holds the data output drivers in a high impedance state. When at a high level NWE allows normal read operation. NOE Negative output enable, when at a high level holds the data output drivers in a high impedance state. When at a low level, the data output driver state is defined by NCS, NWE and CE. If this signal is not used it must be connected to VSS. CE Chip enable, when at a high level allows normal operation. When at a low level CE forces the SRAM to a precharge condition, holds the data output drivers in a high impedance state and disables all the input buffers except the NCS input buffer. If this signal is not used it must be connected to VDD. TRUTH TABLE NCS CE NWE NOE MODE DQ L H H L Read Data Out L H L X Write Data In H X XX XX Deselected High Z X L XX XX Disabled High Z 2 Notes: X: VI=VIH or VIL XX: VSS≤VI≤VDD NOE=H: High Z output state maintained for NCS=X, CE=X, NWE=X HX6356 RADIATION CHARACTERISTICS The SRAM will meet any functional or electrical specification after exposure to a radiation pulse up to the transient dose rate survivability specification, when applied under recommended operating conditions. Note that the current conducted during the pulse by the RAM inputs, outputs, and power supply may significantly exceed the normal operating levels. The application design must accommodate these effects. Total Ionizing Radiation Dose The SRAM will meet all stated functional and electrical specifications over the entire operating temperature range after the specified total ionizing radiation dose. All electrical and timing performance parameters will remain within specifications after rebound at VDD = 5.5 V and T =125°C extrapolated to ten years of operation. Total dose hardness is assured by wafer level testing of process monitor transistors and RAM product using 10 keV X-ray and Co60 radiation sources. Transistor gate threshold shift correlations have been made between 10 keV X-rays applied at a dose rate of 1x105 rad(SiO2)/min at T = 25°C and gamma rays (Cobalt 60 source) to ensure that wafer level X-ray testing is consistent with standard military radiation test environments. Neutron Radiation The SRAM will meet any functional or timing specification after exposure to the specified neutron fluence under recommended operating or storage conditions. This assumes an equivalent neutron energy of 1 MeV. Soft Error Rate Transient Pulse Ionizing Radiation The SRAM has an extremely low Soft Error Rate (SER) as specified in the table below. This hardness level is defined by the Adams 90% worst case cosmic ray environment. The low SER is achieved by the use of a unique 7-transistor memory cell and the oxide isolation of the SOI substrate. The SRAM is capable of writing, reading, and retaining stored data during and after exposure to a transient ionizing radiation pulse up to the transient dose rate upset specification, when applied under recommended operating conditions. To ensure validity of all specified performance parameters before, during, and after radiation (timing degradation during transient pulse radiation (timing degradation during transient pulse radiation is ≤10%), it is suggested that stiffening capacitance be placed on or near the package VDD and VSS, with a maximum inductance between the package (chip) and stiffening capacitance of 0.7 nH per part. If there are no operate-through or valid stored data requirements, typical circuit board mounted de-coupling capacitors are recommended. Latchup The SRAM will not latch up due to any of the above radiation exposure conditions when applied under recommended operating conditions. Fabrication with the SIMOX substrate material provides oxide isolation between adjacent PMOS and NMOS transistors and eliminates any potential SCR latchup structures. Sufficient transistor body tie connections to the p- and n-channel substrates are made to ensure no source/drain snapback occurs. RADIATION HARDNESS RATINGS (1) Parameter Limits (2) Units Test Conditions Total Dose ≥1x106 rad(SiO2) TA=25°C Transient Dose Rate Upset ≥1x1011 rad(Si)/s Pulse width ≤1 µs Transient Dose Rate Survivability ≥1x1012 rad(Si)/s Soft Error Rate <1x10-10 upsets/bit-day Neutron Fluence ≥1x10 14 N/cm2 (1) Device will not latch up due to any of the specified radiation exposure conditions. (2) Operating conditions (unless otherwise specified): VDD=4.5 V to 5.5 V, -55°C to 125°C. 3 Pulse width ≤50 ns, X-ray, VDD=6.0 V, TA=25°C TA=125°C, Adams 90% worst case environment 1 MeV equivalent energy, Unbiased, TA=25°C HX6356 ABSOLUTE MAXIMUM RATINGS (1) Rating Symbol Parameter Min Max Units VDD Positive Supply Voltage (2) -0.5 6.5 V VPIN Voltage on Any Pin (2) -0.5 VDD+0.5 V TSTORE Storage Temperature (Zero Bias) -65 150 °C TSOLDER Soldering Temperature (5 Seconds) 270 °C PD Total Package Power Dissipation (3) 2.0 W IOUT DC or Average Output Current 25 mA VPROT ESD Input Protection Voltage (4) ΘJC Thermal Resistance (Jct-to-Case) TJ Junction Temperature 2000 V 2 °C/W 175 °C – 36 FP (1) Stresses in excess of those listed above may result in permanent damage. These are stress ratings only, and operation at these levels is not implied. Frequent or extended exposure to absolute maximum conditions may affect device reliability. (2) Voltage referenced to VSS. (3) RAM power dissipation (IDDSB + IDDOP) plus RAM output driver power dissipation due to external loading must not exceed this specification. (4) Class 2 electrostatic discharge (ESD) input protection. Tested per MIL-STD-883, Method 3015 by DESC certified lab. RECOMMENDED OPERATING CONDITIONS Description Parameter Symbol Min Typ Max Units VDD Supply Voltage (referenced to VSS) 4.5 5.0 5.5 V TA Ambient Temperature -55 25 125 °C VPIN Voltage on Any Pin (referenced to VSS) -0.3 VDD+0.3 V CAPACITANCE (1) Symbol Parameter Worst Case Typical (1) Min Max Units Test Conditions CI Input Capacitance 7 pF VI=VDD or VSS, f=1 MHz CO Output Capacitance 9 pF VIO=VDD or VSS, f=1 MHz (1) This parameter is tested during initial design characterization only. DATA RETENTION CHARACTERISTICS Symbol Parameter VDR Data Retention Voltage IDR Data Retention Current Typical Worst Case (2) (1) Min Max 2.5 V 500 330 (1) Typical operating conditions: TA= 25°C, pre-radiation. (2) Worst case operating conditions: -55°C to +125°C, post total dose at 25°C. 4 Units µA µA Test Conditions NCS=VDR VI=VDR or VSS NCS=VDD=2.5V, VI=VDD or VSS NCS=VDD=3.0V, VI=VDD or VSS HX6356 DC ELECTRICAL CHARACTERISTICS Symbol Typical Worst Case (2) Units (1) Min Max Parameter Test Conditions 0.2 1.5 mA VIH=VDD, IO=0 VIL=VSS, f=0MHz IDDSBMF Standby Supply Current - Deselected 0.2 1.5 mA IDDOPW Dynamic Supply Current, Selected (Write) 3.4 4.0 mA IDDOPR Dynamic Supply Current, Selected (Read) 2.8 4.0 mA NCS=VDD, IO=0, f=40 MHz f=1 MHz, IO=0, CE=VIH=VDD NCS=VIL=VSS (3) f=1 MHz, IO=0, CE=VIH=VDD NCS=VIL=VSS (3) II Input Leakage Current -1 +1 µA VSS≤VI≤VDD IOZ Output Leakage Current -1 +1 µA VSS≤VIO≤VDD Output=high Z VIL Low-Level Input Voltage V V March Pattern VDD = 4.5V V V March Pattern VDD = 5.5V IDDSB1 VIH VOL VOH Static Supply Current High-Level Input Voltage CMOS TTL 1.7 CMOS TTL 3.2 0.3xVDD 0.8 0.7xVDD 2.2 Low-Level Output Voltage 0.3 0.4 V 0.005 0.1 V VDD = 4.5V, IOL = 10 mA (CMOS) = 8 mA (TTL) VDD = 4.5V, IOL = 200 µA V V VDD = 4.5V, IOH = -5 mA VDD = 4.5V, IOH = -200 µA 4.3 4.5 High-Level Output Voltage 4.2 VDD-0.1 (1) Typical operating conditions: VDD= 5.0 V,TA=25°C, pre-radiation. (2) Worst case operating conditions: VDD=4.5 V to 5.5 V, -55°C to +125°C, post total dose at 25°C. (3) All inputs switching. DC average current. 2.9 V Vref1 + - Valid high output 249Ω DUT output Vref2 + - Valid low output CL >50 pF* *CL = 5 pF for TWLQZ, TSHQZ, TELQZ, and TGHQZ Tester Equivalent Load Circuit 5 HX6356 READ CYCLE AC TIMING CHARACTERISTICS (1) Worst Case (3) Symbol Parameter Typical (2) Units Min Max TAVAVR Address Read Cycle Time 17 25 ns TAVQV Address Access Time 14 TAXQX Address Change to Output Invalid Time 9 TSLQV Chip Select Access Time 17 TSLQX Chip Select Output Enable Time 10 TSHQZ Chip Select Output Disable Time 4 10 ns TEHQV Chip Enable Access Time (4) 17 25 ns TEHQX Chip Enable Output Enable Time (4) 10 TELQZ Chip Enable Output Disable Time (4) 4 10 ns TGLQV Output Enable Access Time 4 9 ns TGLQX Output Enable Output Enable Time 4 TGHQZ Output Enable Output Disable Time 2 25 3 ns ns 25 5 ns ns 5 ns 0 ns 9 ns (1) Test conditions: input switching levels VIL/VIH=0.5V/VDD-0.5V (CMOS), VIL/VIH=0V/3V (TTL), input rise and fall times <1 ns/V, input and output timing reference levels shown in the Tester AC Timing Characteristics table, capacitive output loading CL >50 pF, or equivalent capacitive output loading CL=5 pF for TSHQZ, TELQZ TGHQZ. For CL >50 pF, derate access times by 0.02 ns/pF (typical). (2) Typical operating conditions: VDD=5.0 V, TA=25°C, pre-radiation. (3) Worst case operating conditions: VDD=4.5 V to 5.5 V, post total dose at 25°C. TAVAVR ADDRESS TAVQV TSLQV TAXQX NCS TSLQX DATA OUT TSHQZ HIGH IMPEDANCE DATA VALID TEHQX TEHQV CE TELQZ TGLQX TGLQV TGHQZ NOE (NWE = high) 6 HX6356 WRITE CYCLE AC TIMING CHARACTERISTICS (1) Worst Case (3) Symbol Parameter Typical (2) Min Max Units TAVAVW Write Cycle Time (4) 13 25 ns TWLWH Write Enable Write Pulse Width 9 20 ns TSLWH Chip Select to End of Write Time 10 20 ns TDVWH Data Valid to End of Write Time 5 15 ns TAVWH Address Valid to End of Write Time 9 20 ns TWHDX Data Hold Time after End of Write Time 0 0 ns TAVWL Address Valid Setup to Start of Write Time 0 0 ns TWHAX Address Valid Hold after End of Write Time 0 0 ns TWLQZ Write Enable to Output Disable Time 3 0 TWHQX Write Disable to Output Enable Time 9 5 ns TWHWL Write Disable to Write Enable Pulse Width(5) 4 5 ns TEHWH Chip Enable to End of Write Time 12 20 ns 9 ns (1) Test conditions: input switching levels VIL/VIH=0.5V/VDD-0.5V (CMOS), VIL/VIH=0V/3V (TTL), input rise and fall times <1 ns/V, input and output timing reference levels shown in the Tester AC Timing Characteristics table, capacitive output loading >50 pF, or equivalent capacitive load of 5 pF for TWLQZ. (2) Typical operating conditions: VDD=5.0 V, TA=25°C, pre-radiation. (3) Worst case operating conditions: VDD=4.5 V to 5.5 V, -55 to 125°C, post total dose at 25°C. (4) TAVAVW = TWLWH + TWHWL (5) Guaranteed but not tested. TAVAVW ADDRESS TAVWH TWHAX TAVWL TWHWL TWLWH NWE TWLQZ DATA OUT TWHQX HIGH IMPEDANCE TDVWH DATA IN DATA VALID TSLWH NCS TEHWH CE 7 TWHDX HX6356 DYNAMIC ELECTRICAL CHARACTERISTICS Read Cycle Write Cycle The RAM is asynchronous in operation, allowing the read cycle to be controlled by address, chip select (NCS), or chip enable (CE) (refer to Read Cycle timing diagram). To perform a valid read operation, both chip select and output enable (NOE) must be low and chip enable and write enable (NWE) must be high. The output drivers can be controlled independently by the NOE signal. Consecutive read cycles can be executed with NCS held continuously low, and with CE held continuously high, and toggling the addresses. The write operation is synchronous with respect to the address bits, and control is governed by write enable (NWE), chip select (NCS), or chip enable (CE) edge transitions (refer to Write Cycle timing diagrams). To perform a write operation, both NWE and NCS must be low, and CE must be high. Consecutive write cycles can be performed with NWE or NCS held continuously low, or CE held continuously high. At least one of the control signals must transition to the opposite state between consecutive write operations. For an address activated read cycle, NCS and CE must be valid prior to or coincident with the activating address edge transition(s). Any amount of toggling or skew between address edge transitions is permissible; however, data outputs will become valid TAVQV time following the latest occurring address edge transition. The minimum address activated read cycle time is TAVAV. When the RAM is operated at the minimum address activated read cycle time, the data outputs will remain valid on the RAM I/O until TAXQX time following the next sequential address transition. The write mode can be controlled via three different control signals: NWE, NCS, and CE. All three modes of control are similar except the NCS and CE controlled modes actually disable the RAM during the write recovery pulse. Both CE and NCS fully disable the RAM decode logic and input buffers for power savings. Only the NWE controlled mode is shown in the table and diagram on the previous page for simplicity. However, each mode of control provides the same write cycle timing characteristics. Thus, some of the parameter names referenced below are not shown in the write cycle table or diagram, but indicate which control pin is in control as it switches high or low. To control a read cycle with NCS, all addresses and CE must be valid prior to or coincident with the enabling NCS edge transition. Address or CE edge transitions can occur later than the specified setup times to NCS, however, the valid data access time will be delayed. Any address edge transition, which occurs during the time when NCS is low, will initiate a new read access, and data outputs will not become valid until TAVQV time following the address edge transition. Data outputs will enter a high impedance state TSHQZ time following a disabling NCS edge transition. To write data into the RAM, NWE and NCS must be held low and CE must be held high for at least TWLWH/TSLSH/ TEHEL time. Any amount of edge skew between the signals can be tolerated, and any one of the control signals can initiate or terminate the write operation. For consecutive write operations, write pulses must be separated by the minimum specified TWHWL/TSHSL/TELEH time. Address inputs must be valid at least TAVWL/TAVSL/TAVEH time before the enabling NWE/NCS/CE edge transition, and must remain valid during the entire write time. A valid data overlap of write pulse width time of TDVWH/TDVSH/TDVEL, and an address valid to end of write time of TAVWH/ TAVSH/TAVEL also must be provided for during the write operation. Hold times for address inputs and data inputs with respect to the disabling NWE/NCS/CE edge transition must be a minimum of TWHAX/TSHAX/TELAX time and TWHDX/TSHDX/TELDX time, respectively. The minimum write cycle time is TAVAV. To control a read cycle with CE, all addresses and NCS must be valid prior to or coincident with the enabling CE edge transition. Address or NCS edge transitions can occur later than the specified setup times to CE; however, the valid data access time will be delayed. Any address edge transition which occurs during the time when CE is high will initiate a new read access, and data outputs will not become valid until TAVQV time following the address edge transition. Data outputs will enter a high impedance state TELQZ time following a disabling CE edge transition. 8 HX6356 TESTER AC TIMING CHARACTERISTICS TTL I/O Configuration 3V Input Levels* 0V VDD-0.4V 0.4 V 2.4 V High Z = 2.9V VDD/2 0.5 V High Z 3.4 V High Z VDD-0.5 V 1.5 V 1.5 V Output Sense Levels CMOS I/O Configuration VDD/2 VDD-0.4V 0.4 V High Z 3.4 V High Z 2.4 V High Z = 2.9V * Input rise and fall times <1 ns/V QUALITY AND RADIATION HARDNESS ASSURANCE Honeywell maintains a high level of product integrity through process control, utilizing statistical process control, a complete “Total Quality Assurance System,” a computer data base process performance tracking system, and a radiation-hardness assurance strategy. need to create detailed specifications and offer benefits of improved quality and cost savings through standardization. RELIABILITY The radiation hardness assurance strategy starts with a technology that is resistant to the effects of radiation. Radiation hardness is assured on every wafer by irradiating test structures as well as SRAM product, and then monitoring key parameters which are sensitive to ionizing radiation. Conventional MIL-STD-883 TM 5005 Group E testing, which includes total dose exposure with Cobalt 60, may also be performed as required. This Total Quality approach ensures our customers of a reliable product by engineering in reliability, starting with process development and continuing through product qualification and screening. Honeywell understands the stringent reliability requirements for space and defense systems and has extensive experience in reliability testing on programs of this nature. This experience is derived from comprehensive testing of VLSI processes. Reliability attributes of the RICMOSTM process were characterized by testing specially designed irradiated and non-irradiated test structures from which specific failure mechanisms were evaluated. These specific mechanisms included, but were not limited to, hot carriers, electromigration and time dependent dielectric breakdown. This data was then used to make changes to the design models and process to ensure more reliable products. SCREENING LEVELS In addition, the reliability of the RICMOSTM process and product in a military environment was monitored by testing irradiated and non-irradiated circuits in accelerated dynamic life test conditions. Packages are qualified for product use after undergoing Groups B & D testing as outlined in MIL-STD-883, TM 5005, Class S. The product is qualified by following a screening and testing flow to meet the customer’s requirements. Quality conformance testing is performed as an option on all production lots to ensure the ongoing reliability of the product. Honeywell offers several levels of device screening to meet your system needs. “Engineering Devices” are available with limited performance and screening for breadboarding and/or evaluation testing. Hi-Rel Level B and S devices undergo additional screening per the requirements of MILSTD-883. As a QML supplier, Honeywell also offers QML Class Q and V devices per MIL-PRF-38535 and are available per the applicable Standard Microcircuit Drawing (SMD). QML devices offer ease of procurement by eliminating the 9 HX6356 PACKAGING The 32K x 8 SRAM is offered in two custom 36-lead flat packs (FP). The packages are constructed of multilayer ceramic (Al2O3) and feature internal power and ground planes. The 36-lead flat packs also feature a non-conductive ceramic tie bar on the lead frame. The tie bar allows electrical testing of the device, while preserving the lead integrity during shipping and handling, up to the point of lead forming and insertion. 36-LEAD FP PINOUT VSS VDD A14 A12 A7 A6 A5 A4 A3 A2 A1 A0 DQ0 DQ1 DQ2 NC VDD VSS On the bottom braze 36-lead FP, ceramic chip capacitors can be mounted to the package by the user to maximize supply noise decoupling and increase board packing density. These capacitors attach directly to the internal package power and ground planes. This design minimizes resistance and inductance of the bond wire and package. All NC (no connect) pins should be connected to VSS to prevent charge build up in the radiation environment. 1 2 3 4 5 6 7 8 9 10 11 12 13 14 15 16 17 18 36 35 34 33 32 31 30 29 28 27 26 25 24 23 22 21 20 19 Top View 36-LEAD FLAT PACK—Bottom Braze (22018131-001) E 22018131-001 1 b (width) D G Top View e (pitch) H L L Ceramic Body A J I 0.004 C X VSS Optional Capacitors N VDD VDD Y 1 O V W T P R M All dimensions are in inches [1] VSS 1 F NonConductive Tie-Bar Kovar Lid [3] U 10 S A b C D E e F G H I J L 0.095 ± 0.014 0.008 ± 0.002 0.005 to 0.0075 0.650 ± 0.010 0.630 ± 0.007 0.025 ± 0.002 [2] 0.425 ± 0.005 [2] 0.525 ± 0.005 0.135 ± 0.005 0.030 ± 0.005 0.080 typ. 0.285 ± 0.015 M N O P R S T U V W X Y 0.008 ± 0.003 0.050 ± 0.010 0.090 ref 0.015 ref 0.075 ref 0.113 ± 0.010 0.050 ref 0.030 ref 0.080 ref 0.005 ref 0.450 ref 0.400 ref [1] Parts delivered with leads unformed [2] At tie bar [3] Lid tied to VSS VSS VDD NWE CE A13 A8 A9 A11 NOE A10 NCS DQ7 DQ6 DQ5 DQ4 DQ3 VDD VSS HX6356 36-LEAD FLAT PACK—Top Braze (22019627-001) E 1 22019627-001 b (width) D G Top View e (pitch) All dimensions are in inches H L C J Ceramic Body A Kovar Lid [3] Kovar Lead [1] M I Non-Conductive Tie-Bar S 1 22019627-001 A b C D E e F G H I J L M S 0.085 ± 0.010 0.008 ± 0.002 0.005 to 0.0075 0.650 ± 0.010 0.630 ± 0.007 0.025 ± 0.002 [2] 0.425 ± 0.005 [2] 0.525 ± 0.005 0.135 ± 0.005 0.030 ± 0.005 0.080 typ. 0.285 ± 0.015 0.009 ± 0.003 0.113 ± 0.010 [1] Parts delivered with leads unformed [2] At tie bar [3] Lid tied to VSS F Bottom View Pin 1 Index Bar F16 F7 F6 F5 F4 F3 F2 F8 F13 F14 F1 F1 F1 R R R R R R R R R R R R R NC 1 2 3 4 5 6 7 8 9 10 11 12 13 14 15 16 17 18 VSS VDD A14 A12 A7 A6 A5 A4 A3 A2 A1 A0 DQO DQ1 DQ2 VDD VSS 32K x 8 SRAM VSS VSS VDD NWE CE A13 A8 A9 A11 NOE A10 NCS DQ7 DQ6 DQ5 DQ4 DQ3 VDD VSS 36 35 34 33 32 31 30 29 28 27 26 25 24 23 22 21 20 19 VDD R R R R R R R R R R R R R R VSS R F0 F17 F15 F12 F11 F10 F17 F9 F17 F1 F1 F1 F1 F1 R R R R R R R R R R R R NC VSS 1 2 3 4 5 6 7 8 9 10 11 12 13 14 15 16 17 18 VSS VDD A14 A12 A7 A6 A5 A4 A3 A2 A1 A0 DQO DQ1 DQ2 VDD VSS 32K x 8 SRAM STATIC BURN-IN DIAGRAM DYNAMIC BURN-IN DIAGRAM VSS VDD NWE CE A13 A8 A9 A11 NOE A10 NCS DQ7 DQ6 DQ5 DQ4 DQ3 VDD VSS 36 35 34 33 32 31 30 29 28 27 26 25 24 23 22 21 20 19 VSS VDD = 5.5V, R ≤ 10 KΩ Ambient Temperature ≥ 125 °C VDD = 5.6V, R ≤ 10 KΩ, VIH = VDD, VIL = VSS Ambient Temperature ≥ 125 °C, F0 ≥ 100 KHz Sq Wave Frequency of F1 = F0/2, F2 = F0/4, F3 = F0/8, etc. 11 VDD R R R R R R R R R R R R R R HX6356 ORDERING INFORMATION (1) H 6356 X S X PART NUMBER PROCESS X=SOI SOURCE H=HONEYWELL PACKAGE DESIGNATION X=36-Lead FP (Bottom Braze) P=36-Lead FP (Top Braze) K=Known Good Die - = Bare Die (No Package) H C INPUT BUFFER TYPE C=CMOS Level T=TTL Level SCREEN LEVEL V=QML Class V Q=QML Class Q S=Class S B=Class B E=Engr Device (2) TOTAL DOSE HARDNESS R=1x105 rad(SiO2) F=3x105 rad(SiO2) H=1x106 rad(SiO2) N=No Level Guaranteed (1) Orders may be faxed to 612-954-2051. Please contact our Customer Logistics Department at 612-954-2888 for further information. (2) Engineering Device description: Parameters are tested from -55 to 125°C, 24 hr burn-in, no radiation guaranteed. Contact Factory with other needs. To learn more about Honeywell Solid State Electronics Center, visit our web site at http://www.ssec.honeywell.com Honeywell reserves the right to make changes to any products or technology herein to improve reliability, function or design. Honeywell does not assume any liability arising out of the application or use of any product or circuit described herein; neither does it convey any license under its patent rights nor the rights of others. Helping You Control Your World 900155 Rev. A 6-97 12