TRIQUINT TQP13-N

Production Process
TQP13-N
0.13 um D pHEMT Foundry Service
Features
0.13 um pHEMT (TQP13-N) Process Cross-section
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Low cost Optical Lithography
0.13um Gate
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High Ft, ~95 GHz
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Low Noise, < 0.5 dB in Ku-band
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Interconnects: 2 layers (1 Airbridge & 1 local)
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High Value MIM Capacitor
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Resistors
• Thin film resistor
• Epi resistor
0.13 um pHEMT Device Cross-Section
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Backside Vias
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High Volume 150 mm Wafers
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Same Baseline as Mass Production Today
General Description
Applications
TriQuint's TQP13-N process is a unique, low-cost 150mm wafer,
optical lithography 0.13um pHEMT process used for low noise
and medium power applications in Ku-band through V-band applications. The process features a highly repeatable 0.13um
self-aligned gate pHEMT FET coupled with high density capacitors, epi resistors, thin film resistors (TFR), and 2 layers of gold
interconnect. With typical Ft of 95 GHz, the process is used for
V-band automotive radar and high frequency point to point radio
applications. With typical NF < .5dB in Ku-band, the process is
used for low cost LNB amplifier and convert blocks in consumer
Direct Broadcast Satellite dish systems. Simple to use, repeatable and highly competitive TQP13-N is ideal for emerging consumer mmWave applications.
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DBS LNB and Down Convert
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Automotive Radar
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Satellite Communications
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Low Noise Point to Point/Point to
Multipoint Radio LNA
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High Frequency Medium Power
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High Frequency Mixer
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Fiber Optic TIA and Driver,
10Gb/s - 40Gb/s
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Production Process
TQP13-N
0.13 um D pHEMT Foundry Service
TQP13-N
Process
Details
Process Details (Typical Specifications)
Element
Parameter
Value
Units
D-Mode pHEMT
Vp (1uA/um)
-0.3
V
Idss
100
mA/mm
Gm (max)
750
mS/mm
Breakdown, Vds
8 (typical)
5.5 (min)
V
Ft @ 250mA/mm
95
GHz
Imax (Vgs=0.7 V)
550
mA/mm
NF (12 GHz)
< 0.5 dB
Common Process Element Details
Gate Length
0.13
µm
Interconnect
2
Metal Layers
MIM Caps
Value
340
pF/mm2
Resistors
NiCr
50
Ohms/sq
105
Ohms/sq
Epi
Backside Vias
Mask Layers
Maximum
Ratings
TriQuint Semiconductor
2300 NE Brookwood Pkwy
Hillsboro, Oregon 97124
Yes
No Backside Vias
13
With BacksideVias
15
Storage Temperature Range
-65 to +150
Deg C
Operating Temperature Range
-55 to +150
Deg C
Semiconductors for Communications
www.triquint.com
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Phone: 503-615-9000
Fax: 503-615-8905
Email: [email protected]
Production Process
TQP13-N
0.13 um D pHEMT Foundry Service
Gm (mS/mm)
TQP13-N
Gm vs. Vgs
TQP13-N
Ft vs. Id
TriQuint Semiconductor
2300 NE Brookwood Pkwy
Hillsboro, Oregon 97124
Semiconductors for Communications
www.triquint.com
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2/09/2004
7/22/03
Phone: 503-615-9000
Fax: 503-615-8905
Email: [email protected]
Production Process
TQP13-N
0.13 um D pHEMT Foundry Service
Prototyping and Development
•
•
Prototype Development Quickturn (PDQ):
• Shared maskset
• Standard Cycle Time
Prototype Wafer Option (PWO):
• Customer-specific Masks, Customer Schedule
• 2 wafers delivered
• Standard Cycle Time
Training
•
GaAs Design Classes:
• Half Day Introduction; Upon Request
• Three Days Technical Training; Fall & Spring 0.13
at TriQuint
Oregon
um Lg
facility
Manufacturing Services
•
•
•
•
•
•
•
•
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Mask Making
Production 150 Wafer Fab
Wafer Thinning
Wafer Sawing
Backside Vias
DC Die Sort Testing
RF On-Wafer Testing
Plastic Packaging
RF Packaged Part Testing
Please contact your local TriQuint Semiconductor Representative/ Distributor
or Foundry Services Division Marketing for Additional information:
E-mail: [email protected];
Phone: (503) 615-9000 Fax: (503) 615-8905
TriQuint Semiconductor
2300 NE Brookwood Pkwy
Hillsboro, Oregon 97124
Semiconductors for Communications
www.triquint.com
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7/22/03
Phone: 503-615-9000
Fax: 503-615-8905
Email: [email protected]