CENTRAL CP591V_10

PROCESS
CP591V
Small Signal Transistor
PNP - Amp/Switch Transistor Chip
PROCESS DETAILS
Process
EPITAXIAL PLANAR
Die Size
19 x 19 MILS
Die Thickness
7.1 MILS
Base Bonding Pad Area
3.5 x 4.3 MILS
Emitter Bonding Pad Area
3.5 x 4.5 MILS
Top Side Metalization
Al - 30,000Å
Back Side Metalization
Au - 18,000Å
GEOMETRY
GROSS DIE PER 4 INCH WAFER
30,475
PRINCIPAL DEVICE TYPES
2N2905A
2N2907A
CMPT2907A
CMST2907A
CXT2907A
CZT2907A
PN2907A
BACKSIDE COLLECTOR
R1
R3 (22-March 2010)
w w w. c e n t r a l s e m i . c o m
PROCESS
CP591V
Typical Electrical Characteristics
R3 (22-March 2010)
w w w. c e n t r a l s e m i . c o m