ETC FSC110R

FSC110R
Data Sheet
April 1999
Radiation Hardened, SEGR Resistant
N-Channel Power MOSFET
Ordering Information
Features
100K
• 100V, 3.5A (Note), 0.600Ω
• Total Dose
- Meets Pre-RAD Specifications to 100K RAD (Si)
• Single Event
- SEE Immunity for 1E5 ions/cm2 having an LET of
36MeV/mg/cm2 and a Range of 36µm with VDS up to
80% of Rated Breakdown and VGS of 10V Off-Bias
• Dose Rate
- Typically Survives 3E9 RAD (Si)/s at 80% BVDSS
- Typically Survives 2E12 if Current Limited to IDM
RAD LEVEL
File Number
SCREENING LEVEL
JANKC
4679
PART NUMBER/BRAND
FSC110R
Symbol
D
G
S
• Photo Current
- 0.3nA Per-RAD(Si)/s Typically
• Neutron
- Maintain Pre-RAD Specifications
for 3E13 Neutrons/cm2
- Usable to 3E14 Neutrons/cm2
NOTE: Current rating defined for TO-205AF package.
©2001 Fairchild Semiconductor Corporation
FSC110R Rev. A
FSC110R
TC = 25oC, the Chip is 100% Probed to the Actual Conditions and Limits Specified
Pre Radiation Electrical Specifications
PARAMETER
SYMBOL
TEST CONDITIONS
MIN
TYP
MAX
UNITS
Drain to Source Breakdown Voltage
BVDSS
ID = 1mA, VGS = 0V
100
-
-
V
Gate to Threshold Voltage
VGS(TH)
VGS = VDS, ID = 1mA
1.5
-
4.0
V
Gate to Body Leakage Forward
IGSSF
VGS = +20V
-
-
100
nA
Gate to Body Leakage Reverse
IGSSR
VGS = -20V
-
-
100
nA
Drain Current
IDSS
VDS = 80V, VGS = 0V
-
-
0.025
mA
Diode Forward Voltage
VSD
ID = 3.5A, VGD = 0V
-
0.6
1.8
V
ID = 12VA, VGS = 12V
-
-
0.600
Ω
Drain to Source On Resistance
rDS(ON)
Post Radiation Electrical Specifications
PARAMETER
TC = 25oC, Unless Otherwise Specified. Testing Performed on TO-205AF Packaged
Devices
SYMBOL
NOTES
Drain to Source Breakdown Voltage
BVDSS
3, 4
Gate to Source Threshold Voltage
VGS(TH)
Gate to Body Leakage
Zero to Gate Voltage Drain Current
TEST CONDITIONS
MIN
TYP
MAX
UNITS
VGS = 0V, ID = 1mA
100
-
-
V
3, 4
VGS = VDS, ID = 1mA
1.5
-
4.0
V
IGSS
2, 3, 4
VGS = ±20V, VDS = 0V
-
-
100
nA
IDSS
3, 4
VGS = 0V, VDS = 80V
-
-
25
µA
Drain to Source On Resistance
rDS(ON)
1, 3, 4
VGS = 12V, ID = 2.5A
-
-
0.600
Ω
Diode to Source On-State Voltage
VDS(ON)
1, 3, 4
VGS = 12V, ID = 3.5A
-
-
2.21
V
NOTES:
1. Pulse test, 300µs max.
2. Absolute value.
3. Gamma = 100K RAD (Si).
4. Insitu Gamma bias must be sampled for both VGS = +12V, VDS = 0V and VGS = 0V, VDS = 80% BVDSS.
Single Event Effects (SEE) Note 5
ENVIRONMENT (NOTE 6)
TYPICAL LET
(MeV/mg/cm2)
TYPICAL
RANGE (µ)
APPLIED
VGS BIAS
(V)
(NOTE 7)
MAXIMUM
VDS BIAS (V)
TEST
SYMBOL
ION
SPECIES
Single Event Effects Safe Operating Area
SEESOA
Ni
26
43
-20
100
Br
37
36
-10
100
Br
37
36
-15
80
Br
37
36
-20
50
NOTES:
5. Testing conducted at Brookhaven National Labs; sponsored by Naval Surface Warfare Center (NSWC), Crane, IN.
6. Fluence = 1E5 ions/cm2 (typical), T = 25oC.
7. Does not exhibit Single Event Burnout (SEB) or Single Event Gate Rupture (SEGR).
©2001 Fairchild Semiconductor Corporation
FSC110R Rev. A
FSC110R
Harris Element Evaluation Based on “JANKC” Level of MIL-PRF-19500K, Amendment 1
MIL-STD-750
SUBGROUP
TEST
METHOD
CONDITION
1
Wafer Probe/Electrical Test
2
Visual Inspection
2072
100%
3A
Internal/Die Visual Inspection
2072
10 (0)
3B
Sample Assembly
All test samples assembled in the TO-205AF package.
10 Pieces
Minimum (Note 8)
3C
UIS/Gate Stress
Pre-screen for unclamped inductive switching.
Harris imposed testing.
10 Pieces
Minimum (Note 8)
10 (0)
4
Per “Pre Radiation Electrical Specifications” Table in this data
sheet.
QUANTITY
(ACCEPT NO.)
Stabilization
1032
Condition C, t = 24 hours
Temperature Cycling
1051
Condition C
Constant Acceleration
2006
Y1 direction
Electrical Test
(Read and Record)
High Temperature Gate Stress
Group A, Subgroups 2, 3, and 4 (per FSL110 data sheet)
1042
Electrical Tests
(Read and Record)
High Temperature Drain Stress
Condition B, t = 48 hours, VGS = 80% of rated value
Group A, Subgroup 2 (per FSL110 data sheet)
1042
Electrical Test
(Read and Record)
Steady State Life Test
100%
Condition A, t = 240 hours, VDS = 80% of rated value
Group A, Subgroup 2 (per FSL110 data sheet)
1042
Electrical Test
(Read and Record)
Condition A, VDS = 80% of rated value at one of the following
time/temperature conditions:
Option A: TJ = 175oC, t = 240 hours,
Option B: TJ = 150oC, t = 500 hours or
Option C: TJ = 125oC, t = 1000 hours
Group A, Subgroups 2 and 3 (per FSL110 data sheet)
5A
Wire Bond Evaluation
2037
Condition A
10 (0) Wires or
20 (1) Wires
5B
Die Shear Evaluation
2017
6
SEM
2077
Performed as part of wafer lot acceptance prior to element
evaluation
See Method 2077
7
Total Dose Irradiation
1019
100K RAD (Si). Performed on a wafer by wafer basis prior to
element evaluation.
See Method 1019
5 (0)
NOTE:
8. Sample size is a minimum of 3 die per wafer and 10 die minimum per inspection lot. Sample acceptance per MIL-PRF-19500, paragraph G.5.3.
©2001 Fairchild Semiconductor Corporation
FSC110R Rev. A
FSC110R
Die Characteristics
CONTACT METALLIZATION:
ATTACH AREAS:
Gate and Source - Aluminum (4µ)
Drain - Quad-Metal (Al-Ti-Ni-Au)
[Al (3µ) - Ti (0.3µ) - Ni (1µ) - Au (0.05µ)]
(S) Source - 0.028” x 0.054”
(G) Gate - 0.010” x 0.029”
(D) Drain- Back Side
DIE THICKNESS:
14 mil ±1 mil
Metallization Mask Layout
FSC110R
100 mils
57 mils
©2001 Fairchild Semiconductor Corporation
FSC110R Rev. A
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Definition of Terms
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Definition
Advance Information
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In Design
This datasheet contains the design specifications for
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First Production
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Rev. H