Process: HB10C05-III

Process: HB10C05-III
0.8umルール 高速BiCMOS
■Key Features
Bipolar(NPN, Vertical PNP, LPNP )
Maximum Operating Voltage 10V
Contact Size 0.8um
ft max
NPN/ VPNP 8.0GHz / 5.5GHz @ Vce=1V
fmax
NPN/ VPNP 5.5GHz / 4.0GHz @ Vce=1V
CMOS
Operating Voltage 5.0V (5.5V Max.)
Min. Gate Length 0.8um
Capacitor
MIM ・ MOS
Resistor Poly ・ Base ・ HR
NPN Ae=0.8x1.6 ft-Ic
(GHz)
(GHz)
10
10
8
8
VPNP Ae=0.8x1.6 ft-Ic
Vce=3V
Vce=3V
6
fT
fT
6
Vce=1V
4
4
Vce=1V
2
2
0
0.01
0.1
Ic (mA)
1
0
0.001
0.01
0.1
Ic (mA)
1
Process: HB10C05-IV
完全誘電体分離 高速BiCMOS プロセス
■Key Features
Bipolar(NPN, Vertical PNP, LPNP )
Maximum Operating Voltage 10V
Contact Size 0.8um
ft max NPN/ VPNP 8.0GHz / 6.0GHz @ Vce=1V
fmax NPN/ VPNP 7.0GHz / 6.0GHz @ Vce=1V
No Parasitic Device
CMOS
Operating Voltage 5.0V (5.5V Max.)
Min. Gate Length 0.8um
Capacitor
MIM ・ MOS
Trench_Isolation
Resistor Poly ・ Base ・ HR
NPN8x1DB SOI (Meas.)
1.2 10
10
Emitter
Collector
Base
SiO2
PNP8x1DB SOI (Meas.)
Maximum Oscilation Frequency
1.2 10
1 10 10
10
Maximum Oscilation Frequency
1 10 10
Base
8 10 9
@Vce=3.0V
6 10 9
@Vce=2.0V
freq. [ Hz ]
8 10 9
freq. [ Hz ]
Base
4 10 9
@Vce=3.0V
6 10 9
@Vce=2.0V
4 10 9
@Vce=1.0V
@Vce=1.0V
2 10 9
0
10 -5
2 10 9
10 -4
10 -3
Ic [ A ]
10 -2
0
10 -5
10 -4
10 -3
Ic [ A ]
10 -2