CENTRAL CPD96V_10

PROCESS
CPD96V
Schottky Diode
500mA Low VF Schottky Diode Chip
PROCESS DETAILS
Process
EPITAXIAL PLANAR
Die Size
20 x 20 MILS
Die Thickness
7.1 MILS
Anode Bonding Pad Area
16.4 x 16.4 MILS
Top Side Metalization
Al - 20,000Å
Back Side Metalization
Au - 12,000Å
GEOMETRY
GROSS DIE PER 4 INCH WAFER
28,028
PRINCIPAL DEVICE TYPES
CMLSH05-4
R5 (22-March 2010)
w w w. c e n t r a l s e m i . c o m
PROCESS
CPD96V
Typical Electrical Characteristics
R5 (22-March 2010)
w w w. c e n t r a l s e m i . c o m