FUJITSU FHX04LG

FHX04LG, 05LG, 06LG
Super Low Noise HEMT
FEATURES
• Low Noise Figure: 0.75dB (Typ.)@f=12GHz (FHX04)
• High Associated Gain: 10.5dB (Typ.)@f=12GHz
• Lg ≤ 0.25µm, Wg = 200µm
• Gold Gate Metallization for High Reliability
• Cost Effective Ceramic Microstrip (SMT) Package
• Tape and Reel Packaging Available
DESCRIPTION
The FHX04LG, FHX05LG, FHX06LG is a High Electron Mobility Transistor(HEMT)
intended for general purpose, low noise and high gain amplifiers in the 2-18GHz
frequency range.The devices are packaged in cost effective, low parasitic, hermetically
sealed metal-ceramic package for high volume telecommunication, TVRO, VSAT or other
low noise applications.
Fujitsu’s stringent Quality Assurance Program assures the highest
reliability and consistent performance.
ABSOLUTE MAXIMUM RATING (Ambient Temperature Ta=25°C)
Item
Symbol
Rating
Unit
Drain-Source Voltage
VDS
3.5
V
Gate-Source Voltage
VGS
-3.0
V
Pt*
180
mW
Storage Temperature
Tstg
-65 to +175
°C
Channel Temperature
Tch
175
°C
Total Power Dissipation
*Note: Mounted on Al2O3 board (30 x 30 x 0.65mm)
Fujitsu recommends the following conditions for the reliable operation of GaAs FETs:
1. The drain-source operating voltage (VDS) should not exceed 2 volts.
2. The forward and reverse gate currents should not exceed 0.2 and -0.05 mA respectively with
gate resistance of 4000Ω.
3. The operating channel temperature (Tch) should not exceed 80°C.
ELECTRICAL CHARACTERISTICS (Ambient Temperature Ta=25°C)
Item
Saturated Drain Current
Transconductance
Pinch-off Voltage
Gate Source Breakdown Voltage
Noise Figure
FHX04LG
Associated Gain
Noise Figure
FHX05LG
Associated Gain
Noise Figure
FHX06LG
Associated Gain
Thermal Resistance
AVAILABLE CASE STYLES: LG
Symbol
IDSS
gm
Vp
VGSO
NF
Gas
NF
Gas
NF
Gas
Rth
Condition
VDS = 2V, VGS = 0V
VDS = 2V, IDS =10mA
VDS = 2V, IDS =1mA
IGS = -10µA
VDS = 2V,
IDS = 10mA,
f = 12GHz
Channel to Case
Note: RF parameters are measured on a sample basis as follows:
Lot qty.
Sample qty.
Accept/Reject
1200
or
less
125
(0,1)
1201
to
3200
200
(0,1)
3201
to
10000
315
(1,2)
10001 or
over
500
(1,2)
Edition 1.1
July 1999
1
Min.
15
35
-0.2
-3.0
9.5
9.5
9.5
-
Limit
Typ. Max.
30
60
45
-0.7
0.75
10.5
0.9
10.5
1.1
10.5
300
-1.5
0.85
1.1
1.35
400
Unit
mA
mS
V
V
dB
dB
dB
dB
dB
dB
°C/W
FHX04LG, 05LG, 06LG
Super Low Noise HEMT
POWER DERATING CURVE
DRAIN CURRENT vs. DRAIN-SOURCE VOLTAGE
40
Drain Current (mA)
150
LG
100
50
0
0
50
100
150
VGS =0V
30
-0.2V
20
-0.4V
10
0
200
1
Ambient Temperature (°C)
4
Drain-Source Voltage (V)
NF & Gas vs. IDS
FHX04LG
NF & Gas vs. FREQUENCY
FHX04LG
20
4
3
12
Gas
2
10
1
5
Noise Figure (dB)
15
3
Associated Gain (dB)
VDS=2V
IDS=10mA
Noise Figure (dB)
2
-0.6V
-0.8V
3
f=12GHz
VDS=2V
11
Gas
2
10
9
8
1
NF
7
NF
0
4
8
10 12
0
20
0
0
10
20
30
Frequency (GHz)
Drain Current (mA)
NF & Gas vs. TEMPERATURE
FHX04LG
OUTPUT POWER vs. INPUT POWER
1.5
Noise Figure (dB)
6
f=12GHz
VDS=2V
IDS=10mA
Gas
1.0
0.5
0
15
15
Output Power (dBm)
0
10
NF
5
f=12GHz
VDS=2V
10
Noise Figure Matched
IDS=10mA
5
0
-10
100
200
300
400
Ambient Temperature (°K)
2
Gain Matched
IDS=15mA
-5
0
5
Input Power (dBm)
Associated Gain (dB)
Total Power Dissipation (mW)
200
FHX04LG, 05LG, 06LG
Super Low Noise HEMT
TYPICAL NOISE FIGURE CIRCLE
+j50
FHX04LG
+j100
+j25
Γopt
+j10
+j250
1.0dB
0
10
1.5
25
2.0 2.5 3.0
50
f=12GHz
VDS=2V
IDS=10mA
100
-j10
-j250
-j25
-j100
-j50
Ga(max) AND |S21| vs. FREQUENCY
FHX04LG
VDS=2V
IDS=10mA
Ga(max)
Gain (dB)
12
8
|S21|
4
0
2
4
6 810
20
Frequency (GHz)
NOISE PARAMETERS
FHX04LG
VDS=2V, IDS=10MA
Freq.
(GHz)
2.0
4.0
6.0
8.0
10.0
12.0
14.0
16.0
18.0
Γopt
(MAG)
(ANG)
0.99
0.97
0.93
0.87
0.80
0.72
0.63
0.53
0.42
29.0
53.0
77.0
101.0
127.0
152.0
178.0
-156.0
-129.0
3
NFmin
(dB)
Rn/50
0.33
0.35
0.45
0.55
0.66
0.75
0.88
1.05
1.30
0.43
0.30
0.20
0.12
0.07
0.04
0.03
0.05
0.09
Γopt=0.72∠152°
Rn/50=0.04
NFmin=0.75dB
FHX04LG, 05LG, 06LG
Super Low Noise HEMT
S11
S22
+j50
S21
S12
+90°
+j100
+j25
4
6
2
18 GHz
18 GHz
16
0
12
16
1 GHz
14
25
50Ω
100
4
3
2
2
1
4
0.04 18 GHz
-j250
0.08
2
8
0.12
6
-j25
4
-j100
12
0°
12
14
16
1 GHz
6
10
6
1 GHz
2
8
4
8
10
SCALE FOR |S21|
1 GHz
10
10
180°
250
14
12
-j10
8
+j250
0.16
SCALE FOR |S12|
+j10
16
18 GHz
-90°
-j50
S-PARAMETERS
FHX04LG
VDS = 2V, IDS = 10mA
FREQUENCY
(GHZ)
S11
S21
S12
S22
MAG
ANG
MAG
ANG
MAG
ANG
1.0
0.990
-19.3
4.232
162.1
0.016
2.0
0.965
-37.5
4.115
144.1
0.030
64.8
0.563
-28.1
3.0
0.928
-55.2
3.923
127.4
0.042
53.3
0.546
-41.2
4.0
0.886
-72.1
3.737
110.9
0.052
41.9
0.525
-54.4
5.0
0.844
-88.3
3.518
95.6
0.059
32.2
0.505
-67.6
6.0
0.804
-103.4
3.302
80.8
0.063
23.9
0.489
-80.7
7.0
0.771
-117.4
3.090
66.4
0.066
16.6
0.484
-93.0
8.0
0.741
-129.6
2.876
53.1
0.065
11.5
0.487
-104.5
9.0
0.717
-140.3
2.703
40.7
0.066
4.9
0.497
-115.1
75.1
MAG
ANG
0.576
-14.3
10.0
0.695
-150.8
2.592
28.6
0.065
-0.3
0.503
-124.9
11.0
0.675
-161.2
2.476
16.4
0.064
-3.0
0.517
-135.7
12.0
0.650
-171.5
2.374
4.2
0.064
-6.4
0.534
-145.8
13.0
0.630
178.9
2.277
-7.8
0.063
-9.3
0.552
-156.1
14.0
0.607
170.2
2.176
-19.1
0.064
-12.5
0.585
-164.6
15.0
0.585
161.8
2.144
-30.7
0.065
-16.4
0.617
-171.7
16.0
0.557
151.8
2.151
-43.2
0.066
-22.2
0.642
177.8
17.0
0.522
140.9
2.142
-56.9
0.067
-29.4
0.673
169.5
18.0
0.480
128.4
2.136
-71.2
0.068
-39.2
0.694
159.7
Download S-Parameters, click here
FHX04LG, 05LG, 06LG
Super Low Noise HEMT
Case Style "LG"
Metal-Ceramic Hermetic Package
4.78±0.5
1.78±0.15 1.5±0.3
(0.07)
(0.059)
1.5±0.3
(0.059)
1.0
(0.039)
1.5±0.3
(0.059)
1
4.78±0.5
3
1.78±0.15 1.5±0.3
(0.07)
(0.059)
2
4
0.5
(0.02)
1.3 Max
(0.051)
1.
2.
3.
4.
Gate
Source
Drain
Source
0.1
(0.004)
Unit: mm(inches)
For further information please contact:
FUJITSU COMPOUND SEMICONDUCTOR, INC.
2355 Zanker Rd.
San Jose, CA 95131-1138, U.S.A.
Phone: (408) 232-9500
FAX: (408) 428-9111
www.fcsi.fujitsu.com
FUJITSU MICROELECTRONICS EUROPE, GmbH
Quantum Devices Division
Network House
Norreys Drive
Maidenhead, Berkshire SL6 4FJ
Phone:+44 (0)1628 504800
FAX:+44 (0)1628 504888
CAUTION
Fujitsu Compound Semiconductor Products contain gallium arsenide
(GaAs) which can be hazardous to the human body and the environment.
For safety, observe the following procedures:
• Do not put these products into the mouth.
• Do not alter the form of this product into a gas, powder, or liquid
through burning, crushing, or chemical processing as these by-products
are dangerous to the human body if inhaled, ingested, or swallowed.
• Observe government laws and company regulations when discarding this
product. This product must be discarded in accordance with methods
specified by applicable hazardous waste procedures.
Fujitsu Limited reserves the right to change products and specifications without notice.
The information does not convey any license under rights of Fujitsu Limited or others.
© 1998 FUJITSU COMPOUND SEMICONDUCTOR, INC.
Printed in U.S.A. FCSI0598M200
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